Lithography development and research challenges for the ≤ 22 nm half-pitch

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7470, Issue , 2009, Pages

  Wurm, Stefan ^a  

^a SEMATECH   (United States)

Author keywords

EUV; Lithography; Mask inspection; Nanoimprint

Indexed keywords

BUSINESS CHALLENGES; EUV; HIGH VOLUME MANUFACTURING; INFRASTRUCTURE DEVELOPMENT; INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS; MASK INSPECTION; NANOIMPRINT; NEW BUSINESS MODELS; NEW TECHNOLOGIES; OPTICAL LITHOGRAPHY; PILOT LINE; RESEARCH CHALLENGES; TECHNOLOGY NODES;

MANUFACTURE; PHOTOLITHOGRAPHY; TECHNOLOGICAL FORECASTING; TECHNOLOGY; ULTRAVIOLET DEVICES;

NANOIMPRINT LITHOGRAPHY;

EID: 69949118899     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.834186     Document Type: Conference Paper

References (20)

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