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Volumn 518, Issue 1, 2009, Pages 247-256

A comparative micro-cantilever study of the mechanical behavior of silicon based passivation films

Author keywords

Fracture stress; Micro cantilever; Silicon nitride; Silicon oxide; Silicon oxynitride; Toughness

Indexed keywords

CHEMICAL VAPOR DEPOSITED; COMPREHENSIVE STUDIES; DIELECTRIC THIN FILMS; FRACTURE BEHAVIOR; FRACTURE STRESS; FRACTURE TOUGHNESS VALUES; MEASUREMENT ACCURACY; MECHANICAL BEHAVIOR; MICRO-CANTILEVER; MICRO-CANTILEVERS; NANO-INDENTATION MEASUREMENTS; NITRIDE THIN FILMS; OXYNITRIDES; PASSIVATION FILM; REPRODUCIBILITIES; SILICON OXYNITRIDE; SILICON-BASED; YOUNG'S MODULUS;

EID: 69649101809     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.143     Document Type: Article
Times cited : (230)

References (42)
  • 23
    • 0003419936 scopus 로고
    • Tesmer J.R., and M.N. (Eds), Materials Research Society, Pittsburgh
    • In: Tesmer J.R., and M.N. (Eds). Handbook of Modern Ion Beam Materials Analysis (1995), Materials Research Society, Pittsburgh
    • (1995) Handbook of Modern Ion Beam Materials Analysis
  • 35


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.