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Volumn 518, Issue 1, 2009, Pages 247-256
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A comparative micro-cantilever study of the mechanical behavior of silicon based passivation films
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Author keywords
Fracture stress; Micro cantilever; Silicon nitride; Silicon oxide; Silicon oxynitride; Toughness
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Indexed keywords
CHEMICAL VAPOR DEPOSITED;
COMPREHENSIVE STUDIES;
DIELECTRIC THIN FILMS;
FRACTURE BEHAVIOR;
FRACTURE STRESS;
FRACTURE TOUGHNESS VALUES;
MEASUREMENT ACCURACY;
MECHANICAL BEHAVIOR;
MICRO-CANTILEVER;
MICRO-CANTILEVERS;
NANO-INDENTATION MEASUREMENTS;
NITRIDE THIN FILMS;
OXYNITRIDES;
PASSIVATION FILM;
REPRODUCIBILITIES;
SILICON OXYNITRIDE;
SILICON-BASED;
YOUNG'S MODULUS;
ATOMIC FORCE MICROSCOPY;
FRACTURE;
GLASS FIBERS;
MECHANICAL ENGINEERING;
NANOCANTILEVERS;
NANOINDENTATION;
OXIDE FILMS;
PASSIVATION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON NITRIDE;
SILICON OXIDES;
THIN FILMS;
YIELD STRESS;
FRACTURE TOUGHNESS;
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EID: 69649101809
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2009.07.143 Document Type: Article |
Times cited : (230)
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References (42)
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