Nanoindentation stress-strain curves of plasma-enhanced chemical vapor deposited silicon oxide thin films

Thin Solid Films

Volumn 516, Issue 8, 2008, Pages 1941-1951

  Cao, Zhiqiang ^a   Zhang, Xin ^a  

^a BOSTON UNIVERSITY   (United States)

Author keywords

Nanoindentation; Plasma enhanced chemical vapor deposition; Silicon oxide; Stress strain

Indexed keywords

NANOINDENTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

AMORPHOUS PLASTICITY THEORY; SHEAR TRANSFORMATION;

SILICON COMPOUNDS;

EID: 38649133335     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.09.033     Document Type: Article

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