Highly tetrahedral amorphous carbon films with low stress

Applied Physics Letters

Volumn 69, Issue 16, 1996, Pages 2344-2346

  Chhowalla, M ^a   Yin, Y ^a,b   Amaratunga, G A J ^a   McKenzie, D R ^a,b   Frauenheim, Th ^a,c  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b UNIVERSITY OF SYDNEY   (Australia)

^c CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001527185     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117519     Document Type: Article

References (20)

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