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Volumn 84, Issue 1, 2009, Pages 170-173

Thermal stability of GdScO3 and LaLuO3 films prepared by liquid injection MOCVD

Author keywords

C V measurements; CET; High Dielectrics; SIMS; Thermal treatment

Indexed keywords

ANNEALING CONDITION; C-V CHARACTERISTIC; C-V MEASUREMENTS; CAPACITANCE VOLTAGE MEASUREMENTS; CET; CHEMICAL VAPOUR DEPOSITION; INTERFACIAL LAYER; LIQUID INJECTIONS; LIQUID-INJECTION MOCVD; METAL-ORGANIC; MOCVD; POSITIVE VOLTAGE; SIMS; THERMAL STABILITY; THERMAL TREATMENT; THIN DIELECTRIC FILM;

EID: 69249213937     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.05.017     Document Type: Article
Times cited : (12)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.