Oxygen vacancies in tetragonal ZrO2: Ab initio embedded cluster calculations

Microelectronic Engineering

Volumn 69, Issue 2-4, 2003, Pages 629-632

  Safonov, Andrey A ^a   Bagatur'yants, Alexander A ^a   Korkin, Anatoli A ^b  

^a Kinetic Technologies Ltd   (Russian Federation)

^b MOTOROLA INC   (United States)

Author keywords

Ab initio calculations; Oxygen vacancies; Zirconia

Indexed keywords

ACTIVATION ENERGY; DIFFUSION; ELECTRIC CONDUCTIVITY; ELECTRIC CONDUCTIVITY MEASUREMENT; OXYGEN; SECONDARY ION MASS SPECTROMETRY; THIN FILMS;

SURFACE VACANCIES;

ZIRCONIA;

EID: 0141523263     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00355-1     Document Type: Conference Paper

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