SCOPUS 정보 검색 플랫폼

Volumn 5, Issue 16, 2009, Pages 1850-1853

Generation of metal photomasks by dip-pen nanolithography

(8) Jang, Jae Won a Sanedrin, Raymond G a Senesi, Andrew J a Zheng, Zijian a Chen, Xiaodong a Hwang, Seongpil a Huang, Ling a Mirkin, Chad A a

a NORTHWESTERN UNIVERSITY (United States)

Author keywords

Dip pen nanolithography; Electrodes; Lithography

Indexed keywords

1-OCTANOL; ACETONITRILE SOLUTIONS; AU FILM; CONTACT PRINTING; CONVENTIONAL PHOTOLITHOGRAPHY; DIP-PEN NANOLITHOGRAPHY; ETCHING SOLUTIONS; HYBRID TECHNIQUES; IRON NITRATES; MICROELECTRODE ARRAY;

ACETONITRILE; CHROMIUM; ELECTRODES; GOLD; HYDROCHLORIC ACID; NANOLITHOGRAPHY; OXIDE MINERALS; PHOTOMASKS; POLYETHYLENE GLYCOLS; QUARTZ; THIOUREAS; UREA;

THERMAL EVAPORATION;

ACETONITRILE; ACETONITRILE DERIVATIVE; GOLD; MACROGOL DERIVATIVE; METAL; METAL NANOPARTICLE; NANOWIRE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRODE; MATERIALS TESTING; METHODOLOGY; MICROSCOPY; NANOTECHNOLOGY; PHOTOCHEMISTRY; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; TEMPERATURE;

ACETONITRILES; ELECTRODES; GOLD; MATERIALS TESTING; METAL NANOPARTICLES; METALS; MICROSCOPY; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOTECHNOLOGY; NANOWIRES; PHOTOCHEMISTRY; POLYETHYLENE GLYCOLS; SURFACE PROPERTIES; TEMPERATURE;

EID: 69049111125 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200801837 Document Type: Article

Times cited : (37)

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