-
1
-
-
2942622227
-
-
0022-3093,. 10.1016/j.jnoncrysol.2004.03.096
-
E. Fortunato, A. Pimentel, L. Pereira, A. Goņalves, G. Lavareda, H. Aguas, I. Ferreira, C. N. Carvalho, and R. Martins, J. Non-Cryst. Solids 0022-3093, 338-340, 806 (2004). 10.1016/j.jnoncrysol.2004.03.096
-
(2004)
J. Non-Cryst. Solids
, vol.338
, pp. 806
-
-
Fortunato, E.1
Pimentel, A.2
Pereira, L.3
Goņalves, A.4
Lavareda, G.5
Aguas, H.6
Ferreira, I.7
Carvalho, C.N.8
Martins, R.9
-
2
-
-
34547499398
-
-
10.1889/1.2433418
-
T. Hirao, M. Furuta, H. Furuta, T. Matsuda, T. Hiramatsu, H. Hokari, and M. Yoshida, SID 06 Digest, 37, 18 (2006). 10.1889/1.2433418
-
(2006)
SID 06 Digest
, vol.37
, pp. 18
-
-
Hirao, T.1
Furuta, M.2
Furuta, H.3
Matsuda, T.4
Hiramatsu, T.5
Hokari, H.6
Yoshida, M.7
-
3
-
-
39649124244
-
Enhancement-mode thin film transistor with nitrogen-doped ZnO channel layer deposited by laser molecular beam epitaxy
-
DOI 10.1016/j.tsf.2007.09.034, PII S004060900701591X
-
X. A. Zhang, J. W. Zhang, W. F. Zhang, D. Wang, Z. Bi, X. M. Bian, and X. Hou, Thin Solid Films 0040-6090, 516, 3305 (2008). 10.1016/j.tsf.2007.09.034 (Pubitemid 351288807)
-
(2008)
Thin Solid Films
, vol.516
, Issue.10
, pp. 3305-3308
-
-
Zhang, X.-A.1
Zhang, J.-W.2
Zhang, W.-F.3
Wang, D.4
Bi, Z.5
Bian, X.-M.6
Hou, X.7
-
4
-
-
35649020699
-
High performance thin film transistor with low temperature atomic layer deposition nitrogen-doped ZnO
-
DOI 10.1063/1.2803219
-
S. J. Lim, S. Kwon, H. Kim, and J. S. Park, Appl. Phys. Lett. 0003-6951, 91, 183517 (2007). 10.1063/1.2803219 (Pubitemid 350037253)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.18
, pp. 183517
-
-
Lim, S.J.1
Kwon, S.-J.2
Kim, H.3
Park, J.-S.4
-
5
-
-
27644464403
-
-
0003-6951,. 10.1063/1.2120895
-
W. B. Jackson, R. L. Hoffman, and G. S. Herman, Appl. Phys. Lett. 0003-6951, 87, 193503 (2005). 10.1063/1.2120895
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 193503
-
-
Jackson, W.B.1
Hoffman, R.L.2
Herman, G.S.3
-
6
-
-
13544269370
-
High mobility transparent thin-film transistors with amorphous zinc tin oxide channel layer
-
DOI 10.1063/1.1843286, 013503
-
H. Q. Chiang, J. F. Wager, R. L. Hoffman, J. Jeong, and D. A. Keszler, Appl. Phys. Lett. 0003-6951, 86, 013503 (2005). 10.1063/1.1843286 (Pubitemid 40219489)
-
(2005)
Applied Physics Letters
, vol.86
, Issue.1
, pp. 0135031-0135033
-
-
Chiang, H.Q.1
Wager, J.F.2
Hoffman, R.L.3
Jeong, J.4
Keszler, D.A.5
-
7
-
-
35649010876
-
ZnO-based thin film transistors having high refractive index silicon nitride gate
-
DOI 10.1063/1.2804566
-
K. Remashan, J. H. Jang, D. K. Hwang, and S. J. Park, Appl. Phys. Lett. 0003-6951, 91, 182101 (2007). 10.1063/1.2804566 (Pubitemid 350037200)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.18
, pp. 182101
-
-
Remashan, K.1
Jang, J.H.2
Hwang, D.K.3
Park, S.J.4
-
8
-
-
32044445325
-
High-mobility field-effect transistors based on single-crystalline ZnO channels
-
DOI 10.1143/JJAP.44.L1193
-
J. Nishii, A. Ohtomo, K. Ohtani, H. Ohno, and M. Kawasaki, Jpn. J. Appl. Phys., Part 2 0021-4922, 44, L1193 (2005). 10.1143/JJAP.44.L1193 (Pubitemid 43200671)
-
(2005)
Japanese Journal of Applied Physics, Part 2: Letters
, vol.44
, Issue.37-41
-
-
Nishh, J.1
Ohtomo, A.2
Ohtani, K.3
Ohno, H.4
Kawasaki, M.5
-
9
-
-
33746471712
-
Device isolation of ultraviolet-detecting ZnO-based transistors using energetic B ions
-
DOI 10.1149/1.2212068
-
H. S. Bae, S. Im, and J. H. Song, J. Electrochem. Soc. 0013-4651, 153, G791 (2006). 10.1149/1.2212068 (Pubitemid 44127974)
-
(2006)
Journal of the Electrochemical Society
, vol.153
, Issue.9
-
-
Bae, H.S.1
Im, S.2
Song, J.H.3
-
10
-
-
0033221990
-
Polycrystalline silicon thin-film transistor with a thin amorphous buffer
-
DOI 10.1109/55.798043
-
K. W. Kim, K. S. Cho, and J. Jang, IEEE Electron Device Lett. 0741-3106, 20, 560 (1999). 10.1109/55.798043 (Pubitemid 32081721)
-
(1999)
IEEE Electron Device Letters
, vol.20
, Issue.11
, pp. 560-562
-
-
Kim, K.W.1
Cho, K.S.2
Jang, J.3
-
11
-
-
36449007170
-
-
0021-8979,. 10.1063/1.349794
-
W. W. Wenas, A. Yamada, K. Takahashi, M. Yoshino, and M. Konagai, J. Appl. Phys. 0021-8979, 70, 7119 (1991). 10.1063/1.349794
-
(1991)
J. Appl. Phys.
, vol.70
, pp. 7119
-
-
Wenas, W.W.1
Yamada, A.2
Takahashi, K.3
Yoshino, M.4
Konagai, M.5
-
12
-
-
33846926579
-
Boron-doped zinc oxide thin films for large-area solar cells grown by metal organic chemical vapor deposition
-
DOI 10.1016/j.tsf.2006.09.039, PII S004060900601090X
-
X. L. Chen, B. H. Xu, J. M. Xue, Y. Zhao, C. C. Wei, J. Sun, Y. Wang, X. D. Zhang, and X. H. Geng, Thin Solid Films 0040-6090, 515, 3753 (2007). 10.1016/j.tsf.2006.09.039 (Pubitemid 46240148)
-
(2007)
Thin Solid Films
, vol.515
, Issue.7-8
, pp. 3753-3759
-
-
Chen, X.L.1
Xu, B.H.2
Xue, J.M.3
Zhao, Y.4
Wei, C.C.5
Sun, J.6
Wang, Y.7
Zhang, X.D.8
Geng, X.H.9
-
13
-
-
60049096286
-
-
0374-4884,. 10.3938/jkps.54.535
-
C. Avis, S. H. Kim, K. H. Kim, S. J. Hong, Y. D. Nam, J. H. Hur, and J. Jang, J. Korean Phys. Soc. 0374-4884, 54, 535 (2009). 10.3938/jkps.54.535
-
(2009)
J. Korean Phys. Soc.
, vol.54
, pp. 535
-
-
Avis, C.1
Kim, S.H.2
Kim, K.H.3
Hong, S.J.4
Nam, Y.D.5
Hur, J.H.6
Jang, J.7
-
14
-
-
0034229758
-
Low-temperature epitaxy of ZnO films on Si(001) and silica by reactive e-beam evaporation
-
DOI 10.1016/S0022-0248(00)00397-3
-
H. Z. Wu, K. M. He, D. J. Qiu, and D. M. Huang, J. Cryst. Growth 0022-0248, 217, 131 (2000). 10.1016/S0022-0248(00)00397-3 (Pubitemid 30896500)
-
(2000)
Journal of Crystal Growth
, vol.217
, Issue.1
, pp. 131-137
-
-
Wu, H.Z.1
He, K.M.2
Qiu, D.J.3
Huang, D.M.4
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