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Volumn 27, Issue 4, 2009, Pages 1909-1914

Inductively coupled plasma etching of GaAs suspended photonic crystal cavities

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING PROCESS; GAAS; HIGH PRESSURE; INDUCTIVELY-COUPLED; PHOTONIC CRYSTAL CAVITIES; PROCESS PARAMETERS; RF BIAS; SIDEWALL ROUGHNESS; SYSTEMATIC ANALYSIS;

EID: 68349161043     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3154519     Document Type: Article
Times cited : (13)

References (31)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.