Dry etching and induced damage

Microelectronic Engineering

Volumn 32, Issue 1-4 SPEC. ISS., 1996, Pages 241-253

  Van Der Drift, Emile ^a   Cheung, Rebecca ^b   Zijlstra, Tony ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ETH ZURICH   (Switzerland)

Author keywords

Damage; Dry etching; Electrical characterisation; Nanotechnology; Plasma; Surface analysis

Indexed keywords

ELECTRON BEAMS; ION BOMBARDMENT; NANOTECHNOLOGY; PLASMAS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING GERMANIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS;

SURFACE ANALYSIS;

DRY ETCHING;

EID: 0030234312     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00175-1     Document Type: Article

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