Patterning of alkanethiolate self-assembled monolayers by downstream microwave nitrogen plasma: Negative and positive resist behavior

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 4, 2009, Pages 1949-1957

  Weng, Chih Chiang ^a   Liao, Jiunn Der ^a   Wu, Yi Te ^a   Tsai, Shih Chun ^a   Chen, Chia Hao ^b   Zharnikov, Michael ^c,d  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b Center for Micro/Nano Science and Technology   (Taiwan)

^c NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^d UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALKANETHIOLATES; AMBIENT INTERFACES; AU(1 1 1 ); DOMINANT PROCESS; MONOMOLECULAR RESIST; NITROGEN PLASMAS; PLASMA TREATMENT; PLASMA-INDUCED; POSITIVE RESISTS; PROXIMITY PRINTING; RESIDUAL FILMS; SAMS; TEST SYSTEMS;

ADSORPTION; CARBONIZATION; DESORPTION; MICROWAVES; PLASMA APPLICATIONS; PLASMAS;

SELF ASSEMBLED MONOLAYERS;

EID: 68349148524     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3167366     Document Type: Article

References (27)

1. A. Ulman, Chem. Rev. (Washington, D.C.) 96, 1533 (1996).
2. J. C. Love, L. A. Estroff, J. K. Kriebel, R. G. Nuzzo, and G. M. Whitesides, Chem. Rev. (Washington, D.C.) 105, 1103 (2005).
3. Y. Xia, X. M. Zhao, and G. M. Whitesides, Microelectron. Eng. 32, 255 (1996). 10.1016/0167-9317(95)00174-3 (Pubitemid 126361375)
4. M. J. Lercel, H. G. Craighead, A. N. Parikh, K. Seshadri, and D. L. Allara, J. Vac. Sci. Technol. A 14, 1844 (1996). 10.1116/1.580347 (Pubitemid 126082124)
5. A. Gölzhäuser, W. Geyer, V. Stadler, W. Eck, M. Grunze, K. Edinger, T. Weimann, and P. Hinze, J. Vac. Sci. Technol. B 18, 3414 (2000). 10.1116/1.1319711 (Pubitemid 32088225)
6. M. Zharnikov and M. Grunze, J. Vac. Sci. Technol. B 20, 1793 (2002). 10.1116/1.1514665 (Pubitemid 35354079)
7. T. Massimo, B. Tatiana, S. Bernd, S. Georg, and W. M. Laurens, Appl. Phys. Lett. 81, 2094 (2002). 10.1063/1.1505747
8. R. Maoz, S. Cohen, and J. Sagiv, Adv. Mater. (Weinheim, Ger.) 11, 55 (1999). 10.1002/(SICI)1521-4095(199901)11:1<55::AID-ADMA55>3.0.CO;2-8
9. R. Klauser, I. H. Hong, S. C. Wang, M. Zharnikov, A. Paul, A. Gölzhäuser, A. Terfort, and T. J. Chuang, J. Phys. Chem. B 107, 13133 (2003). 10.1021/jp0307396
10. R. Klauser, M. L. Huang, S. C. Wang, C. H. Chen, T. J. Chuang, A. Terfort, and M. Zharnikov, Langmuir 20, 2050 (2004). 10.1021/la030398n
11. R. Klauser, C. H. Chen, M. L. Huang, S. C. Wang, T. J. Chuang, and M. Zharnikov, J. Electron Spectrosc. Relat. Phenom. 144-147, 393 (2005). 10.1016/j.elspec.2005.01.034 (Pubitemid 40538857)
12. W. Eck, V. Stadler, W. Geyer, M. Zharnikov, A. Gölzhäuser, and M. Grunze, Adv. Mater. (Weinheim, Ger.) 12, 805 (2000). 10.1002/(SICI)1521- 4095(200006)12:11<805::AID-ADMA805>3.0.CO;2-0
13. A. Gölzhäuser, W. Eck, W. Geyer, V. Stadler, T. Weimann, P. Hinze and M. Grunze, Adv. Mater. (Weinheim, Ger.) 13, 806 (2001). 10.1002/1521-4095(200106)13:11%3C803::AID-ADMA806%3E3.0.CO;2-W (Pubitemid 32543982)
14. A. Turchanin, A. Tinazli, M. El-Desawy, H. GroΒmann, M. Schnietz, Harun H. Solak, R. Tamṕ, and A. Gölzhäuser, Adv. Mater. (Weinheim, Ger.) 20, 471 (2008). 10.1002/adma.200702189
15. N. Ballav, A. Shaporenko, A. Terfort, and M. Zharnikov, Adv. Mater. (Weinheim, Ger.) 19, 998 (2007). 10.1002/adma.200602168 (Pubitemid 46942302)
16. N. Ballav, S. Schlip, and M. Zharnikov, Angew. Chem., Int. Ed. 47, 1421 (2008). 10.1002/anie.200704105
17. W. E. S. Unger, A. Lippitz, Th. Gross, J. F. Friedrich, Ch. Wöll, and L. Nick, Langmuir 15, 1161 (1999). 10.1021/la981174l
18. J. D. Liao, M. C. Wang, C. C. Weng, R. Klauser, S. Frey, M. Zharnikov, and M. Grunze, J. Phys. Chem. B 106, 77 (2002). 10.1021/jp011119c (Pubitemid 35263201)
19. M. C. Wang, J. D. Liao, C. C. Weng, R. Klauser, S. Frey, M. Zharnikov, and M. Grunze, J. Phys. Chem. B 106, 6220 (2002). 10.1021/jp014166d (Pubitemid 35281806)
20. M. C. Wang, J. D. Liao, C. C. Weng, R. Klauser, A. Shaporenko, M. Grunze, and M. Zharnikov, Langmuir 19, 9774 (2003). 10.1021/la030207g
21. C. C. Weng, J. D. Liao, Y. T. Wu, M. C. Wang, R. Klauser, M. Grunze, and M. Zharnikov, Langmuir 20, 10093 (2004). 10.1021/la040058h
22. C. C. Weng, J. D. Liao, Y. T. Wu, M. C. Wang, R. Klauser, and M. Zharnikov, J. Phys. Chem. B 110, 12523 (2006). 10.1021/jp060572r (Pubitemid 44139439)
23. Y. T. Wu, J. D. Liao, C. C. Weng, M. C. Wang, J. E. Chang, C. H. Chen, and M. Zharnikov, Contrib. Plasma Phys. 47, 89 (2007). 10.1002/ctpp.200710013
24. A. Ulman, Thin Films: Self-Assembled Monolayers of Thiols (Academic, San Diego, CA, 1998).
25. A. Rees and M. Buckley, article from Hiden Analytical, Warrington, UK (2002).
26. Y. T. Wu, J. D. Liao, C. C. Weng, M. C. Wang, C. H. Chen, and M. Zharnikov, J. Vac. Sci. Technol. B 25, 1729 (2007). 10.1116/1.2782581 (Pubitemid 47463667)
27. C. H. Chen, M. L. Huang, S. C. Wang, R. Klauser, A. Shaporenko, and M. Zharnikov, J. Phys. Chem. B 110, 17878 (2006). 10.1021/jp063779t (Pubitemid 44559560)