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Journal of Materials Science: Materials in Electronics

Volumn 20, Issue 9, 2009, Pages 879-884

Influence of post-deposition annealing on the microstructure and properties of Ga 2O 3:Mn thin films deposited by RF planar magnetron sputtering

(2) Kim, Joo Han a Yoon, Kyung Ho a

a Chungbuk National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS STRUCTURES; ANNEALING TEMPERATURES; ARGON MIXTURE; CRYSTALLINITIES; CRYSTALLOGRAPHIC PLANE; LATTICE PARAMETERS; MICROSTRUCTURE AND PROPERTIES; MN-DOPED; PLANAR MAGNETRON; POST DEPOSITION ANNEALING; RADIO FREQUENCIES; SILICON (100); SUBSTRATE SURFACE;

ANNEALING; ARGON; GALLIUM; GALLIUM ALLOYS; MAGNETRONS; MANGANESE; MANGANESE COMPOUNDS; MICROSTRUCTURE; OXYGEN; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

AMORPHOUS FILMS;

EID: 68249101687 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-008-9810-2 Document Type: Article

Times cited : (19)

References (18)

1
- 0031161998
- doi: 10.1063/1.119233
- N. Ueda, H. Hosono, R. Waseda, H. Kawazoe, Appl. Phys. Lett 70, 3561 (1997). doi: 10.1063/1.119233
- (1997) Appl. Phys. Lett , vol.70 , pp. 3561
- Ueda, N.¹ Hosono, H.² Waseda, R.³ Kawazoe, H.⁴

2
- 4243198806
- doi: 10.1103/PhysRevB.68.155207
- M. Yamaga, E.G. Víllora, K. Shimamura, N. Ichinose, M. Honda, Phys. Rev. B 68, 155207 (2003). doi: 10.1103/PhysRevB.68.155207
- (2003) Phys. Rev. B , vol.68 , pp. 155207
- Yamaga, M.¹ Víllora, E.G.² Shimamura, K.³ Ichinose, N.⁴ Honda, M.⁵

3
- 28144454453
- doi: 10.1016/j.tsf.2005.08.187
- K. Matsuzaki, H. Hiramatsu, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano et al., Thin Solid Films 496, 37 (2006). doi: 10.1016/j.tsf.2005.08.187
- (2006) Thin Solid Films , vol.496 , pp. 37
- Matsuzaki, K.¹ Hiramatsu, H.² Nomura, K.³ Yanagi, H.⁴ Kamiya, T.⁵ Hirano, M.⁶

4
- 0026171269
- doi: 10.1016/0925-4005(91)80148-D
- M. Fleischer, H. Meixner, Sens. Actuators B 4, 437 (1991). doi: 10.1016/ 0925-4005(91)80148-D
- (1991) Sens. Actuators B , vol.4 , pp. 437
- Fleischer, M.¹ Meixner, H.²

5
- 0000465918
- doi: 10.1063/1.115725
- M. Passlack, M. Hong, J.P. Mannaerts, Appl. Phys. Lett. 68, 1099 (1996). doi: 10.1063/1.115725
- (1996) Appl. Phys. Lett. , vol.68 , pp. 1099
- Passlack, M.¹ Hong, M.² Mannaerts, J.P.³

6
- 0032576518
- doi: 10.1063/1.122927
- F. Ren, M. Hong, S.N.G. Chu, M.A. Marcus, M.J. Schurman, A. Baca et al., Appl. Phys. Lett. 73, 3893 (1998). doi: 10.1063/1.122927
- (1998) Appl. Phys. Lett. , vol.73 , pp. 3893
- Ren, F.¹ Hong, M.² Chu, S.N.G.³ Marcus, M.A.⁴ Schurman, M.J.⁵ Baca, A.⁶

7
- 0035927046
- doi: 10.1063/1.1374498
- C.H. Liang, G.W. Meng, G.Z. Wang, Y.W. Wang, L.D. Zhang, S.Y. Zhang, Appl. Phys. Lett. 78, 3202 (2001). doi: 10.1063/1.1374498
- (2001) Appl. Phys. Lett. , vol.78 , pp. 3202
- Liang, C.H.¹ Meng, G.W.² Wang, G.Z.³ Wang, Y.W.⁴ Zhang, L.D.⁵ Zhang, S.Y.⁶

8
- 27944474300
- doi: 10.1063/1.2135867
- P.-C. Chang, Z. Fan, W.-Y. Tseng, A. Rajagopal, J.G. Lu, Appl. Phys. Lett. 87, 222102 (2005). doi: 10.1063/1.2135867
- (2005) Appl. Phys. Lett. , vol.87 , pp. 222102
- Chang, P.-C.¹ Fan, Z.² Tseng, W.-Y.³ Rajagopal, A.⁴ Lu, J.G.⁵

9
- 0030168927
- doi: 10.1016/0040-6090(95)08161-5
- G.A. Battiston, R. Gerbasi, M. Porchia, R. Bertoncello, F. Caccavale, Thin Solid Films 279, 115 (1996). doi: 10.1016/0040-6090(95)08161-5
- (1996) Thin Solid Films , vol.279 , pp. 115
- Battiston, G.A.¹ Gerbasi, R.² Porchia, M.³ Bertoncello, R.⁴ Caccavale, F.⁵

10
- 0033703990
- doi: 10.1143/JJAP.39.L524
- T. Minami, T. Shirai, T. Nakatani, T. Miyata, Jpn. J. Appl. Phys. 39, L524 (2000). doi: 10.1143/JJAP.39.L524
- (2000) Jpn. J. Appl. Phys. , vol.39
- Minami, T.¹ Shirai, T.² Nakatani, T.³ Miyata, T.⁴

11
- 0346216006
- doi: 10.1063/1.1630845
- M.F. Al-Kuhaili, S.M.A. Durrani, E.E. Khawaja, Appl. Phys. Lett. 83, 4533 (2003). doi: 10.1063/1.1630845
- (2003) Appl. Phys. Lett. , vol.83 , pp. 4533
- Al-Kuhaili, M.F.¹ Durrani, S.M.A.² Khawaja, E.E.³

12
- 0002229170
- doi: 10.1039/jm9960600027
- M. Nieminen, L. Niinistö, E. Rauhala, J. Mater. Chem. 6, 27 (1996). doi: 10.1039/jm9960600027
- (1996) J. Mater. Chem. , vol.6 , pp. 27
- Nieminen, M.¹ Niinistö, L.² Rauhala, E.³

13
- 0008723743
- doi: 10.1149/1.1342183
- A. Ortiz, J.C. Alonso, E. Andrade, C. Urbiola, J. Electrochem. Soc. 148, F26 (2001). doi: 10.1149/1.1342183
- (2001) J. Electrochem. Soc. , vol.148
- Ortiz, A.¹ Alonso, J.C.² Andrade, E.³ Urbiola, C.⁴

14
- 0034225594
- doi: 10.1116/1.582332
- T. Minami, T. Nakatani, T. Miyata, J. Vac. Sci. Technol. A 18, 1234 (2000). doi: 10.1116/1.582332
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 1234
- Minami, T.¹ Nakatani, T.² Miyata, T.³

15
- 0000550214
- doi: 10.1063/1.121602
- T. Xiao, A.H. Kitai, G. Liu, A. Nakua, J. Barbier, Appl. Phys. Lett. 72, 3356 (1998). doi: 10.1063/1.121602
- (1998) Appl. Phys. Lett. , vol.72 , pp. 3356
- Xiao, T.¹ Kitai, A.H.² Liu, G.³ Nakua, A.⁴ Barbier, J.⁵

16
- 0003495856
- Joint Committee on Powder Diffraction Standards (JCPDS) Inorganic, No. 43-1012
- Joint Committee on Powder Diffraction Standards (JCPDS), Powder Diffraction Files, Inorganic, No. 43-1012
- Powder Diffraction Files

17
- 0001718759
- doi: 10.1021/ja01123a039
- R. Roy, V.G. Hill, E.F. Osborn, J. Am. Chem. Soc. 74, 719 (1952). doi: 10.1021/ja01123a039
- (1952) J. Am. Chem. Soc. , vol.74 , pp. 719
- Roy, R.¹ Hill, V.G.² Osborn, E.F.³

18
- 0003427458
- 2nd edn. (Addison-Wesley, Reading)
- B.D. Cullity, Elements of X-ray Diffraction, 2nd edn. (Addison-Wesley, Reading, 1978)
- (1978) Elements of X-ray Diffraction
- Cullity, B.D.¹

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