Optical properties of gallium oxide films deposited by electron-beam evaporation

Applied Physics Letters

Volumn 83, Issue 22, 2003, Pages 4533-4535

  Al Kuhaili, M F ^a   Durrani, S M A ^a   Khawaja, E E ^a  

^a KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS   (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ENERGY GAP; EVAPORATION; LIGHT REFLECTION; LIGHT TRANSMISSION; PARTIAL PRESSURE; REFRACTIVE INDEX; SEMICONDUCTING GALLIUM COMPOUNDS; STOICHIOMETRY; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON BEAM EVAPORATION; GALLIUM OXIDE;

AMORPHOUS FILMS;

EID: 0346216006     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1630845     Document Type: Article

References (21)

1. L. Binet and D. Gourier, J. Phys. Chem. Solids 59, 1241 (1998).
2. J. Hao and M. Cocivera, J. Phys. D 35, 433 (2002).
3. M. Ogita, K. Higo, Y. Nakanishi, and Y. Hatanaka, Appl. Surf. Sci. 175-176, 721 (2001).
4. M. Rebien, W. Henrion, M. Hong, J. P. Mannaerts, and M. Fleischer, Appl. Phys. Lett. 81, 250 (2002).
5. M. Passlack, E. F. Schubert, W. S. Hobson, M. Hong, N. Moriya, S. N. G. Chu, K. Konstadinidis, J. P. Mannaerts, M. L. Schnoes, and G. J. Zydzik, J. Appl. Phys. 77, 686 (1995).
6. M. Orita, H. Ohta, M. Hirano, and H. Hosono, Appl. Phys. Lett. 77, 4166 (2000).
7. N. Ueda, H. Hosono, R. Waseda, and H. Kawazoe, Appl. Phys. Lett. 70, 3561 (1997).
8. H.-G. Kim and W.-T. Kim, J. Appl. Phys. 62, 2000 (1987).
9. P. Wu, Y.-M. Gao, R. Kershaw, K. Dwight, and A. Wold, Mater. Res. Bull. 25, 357 (1990).
10. A. Ortiz, J. C. Alonso, E. Andrade, and C. Urbiola, J. Electrochem. Soc. 148, F26 (2001).
11. M. Fleischer, W. Hanrieder, and H. Meixner, Thin Solid Films 190, 93 (1990).
12. G. A. Battiston, R. Gerbasi, M. Porchia, R. Bertoncello, and F. Caccavale, Thin Solid Films 279, 115 (1996).
13. N. C. Oldham, C. J. Hill, C. M. Garland, and T. C. McGill, J. Vac. Sci. Technol. A 20, 809 (2002).
14. CRC Handbook of Chemistry and Physics, 70th ed., edited by R. C. Weast (CRC Press, Boca Raton, 1989), p. B-92.
15. R. E. Denton, R. D. Campbell, and S. G. Tomlin, J. Phys. D 5, 852 (1972).
16. G. Hollinger, R. Skheyta-Kabbani, and M. Gendry, Phys. Rev. B 49, 11159 (1994).
17. T. L. Barr, in Quantitative Surface Analysis of Materials, edited by N. S. McIntyre (American Society for Testing and Materials, Philadelphia, 1978), p. 83.
18. D. Mergel, D. Buschendorf, S. Eggert, R. Grammes, and S. Samset, Thin Solid Films 371, 218 (2000).
19. S. K. Deb and J. A. Chopoorian, J. Appl. Phys. 37, 4818 (1968).
20. J. I. Pankove, Optical Processes in Semiconductors (Dover, New York, 1971), p. 36.
21. H. H. Tippins, Phys. Rev. A 140, 316 (1965).