Chemical vapour deposition and characterization of gallium oxide thin films

Thin Solid Films

Volumn 279, Issue 1-2, 1996, Pages 115-118

  Battiston, G A ^a   Gerbasi, R ^a   Porchia, M ^a   Bertoncello, R ^b   Caccavale, F ^b  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

Chemical vapour deposition; Gallium oxide

Indexed keywords

ANNEALING; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; CRYSTALLIZATION; FILM GROWTH; HEAT TREATMENT; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING GALLIUM COMPOUNDS; STOICHIOMETRY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM STRUCTURE; GALLIUM OXIDE; GALLIUM TRISHEXAFLUOROACETYLACETONATE; PHASE MODIFICATION;

THIN FILMS;

EID: 0030168927     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08161-5     Document Type: Article

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