Intersubband transition at 1.52μm in GAN/ALN multiple quantum wells grown by metal organic vapor phase epitaxy

Applied Physics Express

Volumn 2, Issue 6, 2009, Pages

  Sodabanlu, Hassanet ^a   Yang, Jung Seung ^a   Sugiyama, Masakazu ^a   Shimogaki, Yukihiro ^a   Nakano, Yoshiaki ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION PEAKS; ALN; CARBON IMPURITIES; CARRIER DENSITY; HIGH QUALITY; HIGHER TEMPERATURES; INTERSUBBAND TRANSITIONS; LOW TEMPERATURE GROWTH; METAL-ORGANIC VAPOR PHASE EPITAXY; MULTIPLE QUANTUM WELLS; PULSE INJECTION METHOD; ROOM TEMPERATURE;

CRYSTAL GROWTH; GALLIUM ALLOYS; GALLIUM NITRIDE; ORGANOMETALLICS; PHASE INTERFACES; SEMICONDUCTING GALLIUM; SEMICONDUCTOR QUANTUM WELLS; VAPORS;

METALLORGANIC VAPOR PHASE EPITAXY;

EID: 67949114306     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.2.061002     Document Type: Article

References (19)

1. H. M. Ng, C. Gmachl, S. N. G. Chu, and A. Y. Cho: J. Cryst. Growth 220 (2000) 432.
2. K. Kishino, A. Kikuchi, H. Kanazawa, and T. Tachibana: Appl. Phys. Lett. 81 (2002) 1234.
3. C. Gmachl, S. V. Frolov, H. M. Ng, N. G. Chu, and A. Y. Cho: Electron. Lett. 37 (2001) 378.
4. J. Heber, C. Gmachl, H. Ng, and A. Cho: Appl. Phys. Lett. 81 (2002) 1237.
5. N. Iizuka, K. Kaneko, and N. Suzuki: Appl. Phys. Lett. 81 (2002) 1803.
6. J. Hamazaki, S. Matsui, H. Kunugida, K. Ema, H. Kanazawa, T. Tachibana, A. Kikuchi, and K. Kishino: Appl. Phys. Lett. 84 (2004) 1102.
7. N. Iizuka, K. Kaneko, and N. Suzuki: IEEE J. Quantum Electron. 42(2006) 765.
8. Y. Li, A. Bhattacharyya, C. Thomidis, T. D. Moustakas, and R. Paiella: Opt. Express 15 (2007) 17922.
9. N. Iizuka, T. Shimizu, C. Kumtornkittikul, M. Sugiyama, and Y. Nakano: presented at OECC2008, Opto-Electronics and Communications Conf., 2008.
10. I. Waki, C. Kumtornkittikul, Y. Shimogaki, and Y. Nakano: Appl. Phys. Lett. 82 (2003) 4465 [Errata; 84 (2004) 3703].
11. S. Nicolay, E. Feltin, J. F. Carlin, M. Mosca, L. Nevou, M. Tchernycheva, F. H. Julien, M. Ilegems, and N. Grandjean: Appl. Phys. Lett. 88 (2006) 151902.
12. J. S. Yang, H. Sodabanlu, M. Sugiyama, Y. Nakano, and Y. Shimogaki: Appl. Phys. Express 2 (2009) 051004.
13. S. Nicolay, E. Feltin, J. F. Carlin, N. Grandjean, L. Nevou, F. H. Julien, M. Schmidbauer, T. Remmele, and M. Albrecht: Appl. Phys. Lett. 91 (2007) 061927.
14. C. Bayram, N. Péré-laperne, R. McClintock, B. Fain, and M. Razeghi: Appl. Phys. Lett. 94 (2009) 121902.
15. N. A. Fichtenbauma, T. E. Mates, S. Keller, S. P. DenBaars, and U. K. Mishraa: J. Cryst. Growth 310 (2008) 1124.
16. C. H. Seager, A. F. Wright, J. Yu, and W. Götz: J. Appl. Phys. 92(2002) 6553.
17. J. S. Yang, H. Sodabanlu, M. Sugiyama, Y. Nakano, and Y. Shimogaki: presented at 68th Autumn Meeting, The Japan Society of Applied Physics, 2007.
18. E. Baumann, F. R. Giorgetta, D. Hofstetter, S. Golka, W. Schrenk, G. Strasser, L. Kirste, S. Nicolay, E. Feltin, J.-F. Carlin, and N. Grandjean: Appl. Phys. Lett. 89 (2006) 041106.
19. N. Suzuki, N. Iizuka, and K. Kaneko: Jpn. J. Appl. Phys. 42 (2003) 132.