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Volumn 19, Issue 6, 2009, Pages

Deep etching of glass wafers using sputtered molybdenum masks

Author keywords

[No Author keywords available]

Indexed keywords

DEEP ETCHING; GLASS WAFER; LOW-COST TECHNOLOGY; MASK LAYER;

EID: 67849088790     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/6/067001     Document Type: Article
Times cited : (30)

References (20)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.