Defect-free wet etching through pyrex glass using Cr/Au mask

Microsystem Technologies

Volumn 12, Issue 10-11, 2006, Pages 935-939

  Tay, Francis E H ^a,b   Iliescu, Ciprian ^b   Jing, Ji ^a   Miao, Jianmin ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF BIOENGINEERING AND NANOTECHNOLOGY   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; GLASS; MASKS; RESIDUAL STRESSES; STRESSES;

PHOTORESIST; PYREX GLASS; WET ETCHING;

ETCHING;

EID: 33747591631     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0116-0     Document Type: Conference Paper

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