Dual patterning and sequential functionalization of block copolymers using photocrosslinkable random copolymer film

Nanotechnology

Volumn 20, Issue 28, 2009, Pages

  Ku, Se Jin ^a   Kim, Su Min ^a   Kim, Jin Baek ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACID CATALYST; GOLD NANOPARTICLES; NOVEL METHODS; POLY(TERT-BUTYL ACRYLATE); POTENTIAL APPLICATIONS; RANDOM COPOLYMER; SEQUENTIAL FUNCTIONALIZATION; TERT-BUTYL ACRYLATE; TERT-BUTYL ESTERS;

BLOCK COPOLYMERS; CARBOXYLIC ACIDS; ESTERS; ORGANIC ACIDS; ORGANIC POLYMERS; PLASTIC PRODUCTS; POLYSTYRENES; STYRENE;

COPOLYMERIZATION;

ACRYLIC ACID DERIVATIVE; CARBOXYLIC ACID; GOLD NANOPARTICLE; STYRENE DERIVATIVE; ACRYLIC ACID TERT BUTYL ESTER; NANOPARTICLE; POLY(STYRENE B TERT BUTYLACRYLATE); POLY(STYRENE-B-TERT-BUTYLACRYLATE); POLYMER; POLYSTYRENE DERIVATIVE; TERT-BUTYL ACRYLATE;

ARTICLE; CATALYST; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; CROSS LINKING; DEPROTECTION REACTION; FILM; HEATING; MATERIAL COATING; NANOFABRICATION; PRIORITY JOURNAL; STRUCTURE ANALYSIS; CHEMISTRY; METHODOLOGY; PHOTOCHEMISTRY; SYNTHESIS;

ACRYLATES; NANOPARTICLES; PHOTOCHEMISTRY; POLYMERS; POLYSTYRENES;

EID: 67651146724     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/28/285304     Document Type: Article

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