Properties of ZnO:Al films deposited on polycarbonate substrate

Vacuum

Volumn 83, Issue 12, 2009, Pages 1435-1437

  Liu, Yaodong ^a   Li, Qiang ^a   Shao, Huiliang ^a  

^a CHANGCHUN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Polycarbonate; Pulsed laser deposition; Zinc oxide

Indexed keywords

1064 NM; ALUMINUM-DOPED ZINC OXIDE; DEEP LEVEL EMISSION; LASER SOURCES; LOW SUBSTRATE TEMPERATURE; ND-YAG LASERS; OXYGEN PRESSURE; POLYCARBONATE SUBSTRATES; POLYCRYSTALLINE ZNO; PREFERRED ORIENTATIONS; PROCESS PARAMETERS; PULSED-LASER DEPOSITION TECHNIQUE; VIOLET EMISSION; VISIBLE SPECTRA; ZNO; ZNO:AL FILMS;

ALUMINA; ALUMINUM; ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; LASERS; METALLIC FILMS; NEODYMIUM LASERS; OXYGEN; PLASTIC PRODUCTS; PULSED LASER DEPOSITION; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; SURFACE STRUCTURE; THICK FILMS; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 67650753542     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.05.006     Document Type: Article

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