Bandgap measurement of thin dielectric films using monochromated STEM-EELS

Ultramicroscopy

Volumn 109, Issue 9, 2009, Pages 1183-1188

  Park, Jucheol ^a   Heo, Sung ^a   Chung, Jae Gwan ^a   Kim, Heekoo ^a   Lee, HyungIk ^a   Kim, Kihong ^a   Park, Gyeong Su ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

a SiNx; AES; Bandgap measurement; Charge trap memory; EELS; Monochromtor; REELS; SiO2; STEM

Indexed keywords

A-SINX; AES; BANDGAP MEASUREMENT; CHARGE TRAP MEMORY; EELS; MONOCHROMTOR; SIO2; STEM;

AUGER ELECTRON SPECTROSCOPY; CHARGE TRAPPING; DIELECTRIC DEVICES; DIELECTRIC FILMS; ELECTRON ENERGY ANALYZERS; ELECTRON SCATTERING; ELECTRONS; ENERGY GAP; MONOCHROMATORS; REELS; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON ENERGY LOSS SPECTROSCOPY;

SILICON DIOXIDE;

ARTICLE; AUGER ELECTRON SPECTROSCOPY; CONTROLLED STUDY; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM; INTERMETHOD COMPARISON; RELIABILITY; SCANNING TRANSMISSION ELECTRON MICROSCOPY;

EID: 67650686801     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2009.04.005     Document Type: Article

References (27)

1. Chen T.S., Wu K.H., Chung H., and Kao C.H. IEEE Electr. Dev. Lett. 25 (2004) 205
2. Terauchi M., Tanaka M., Tsuno K., and Ishida M. J. Microsc. 194 (1999) 203
3. Erni R., and Browning N.D. Ultramicroscopy 104 (2005) 176
4. Erni R., and Browning N.D. Ultramicroscopy 107 (2007) 267
5. Erni R., and Browning N.D. Ultramicroscopy 108 (2008) 84
6. Pantel R., Cheynet M.C., and Tichelaar F.D. Micron 37 (2006) 657
7. Gu L., Srot V., Sigle W., Koch C., van Aken P., Scholz F., Thapa S.B., Kirchner C., Jetter M., and Rühle M. Phys. Rev. B 75 (2007) 195214
8. Lazar S., Botton G.A., Wu M.Y., Tichelaar F.D., and Zandbergen H.W. Ultramicroscopy 96 (2003) 535
9. Cerenkov P.A. Dokl. Akad. Nauk. SSSR 2 (1934) 451
10. Chen C.H., Silcox J., and Vincent R. Phys. Rev. B 12 (1975) 64
11. Cowley J.M. Phys. Rev. B 25 (1982) 1401
12. Midgley P.A. Ultramicroscopy 76 (1999) 91
13. Stoeger-Pollach M., Franco H., Schattschneider P., Lazar S., Schaffer B., Grogger W., and Zandbergen H.W. Micron 37 (2006) 396
14. Kimoto K., Kothleitner G., Grogger W., Matsui Y., and Hofer F. Micron 36 (2005) 185
15. Lazar S., Botton G.A., and Zandbergen H.W. Ultramicroscopy 106 (2006) 1091
16. Rafferty R., and Brown L.M. Phys. Rev. B 58 (1998) 10326
17. Rafferty B., Pennycook S.J., and Brown L.M. J. Electron Microsc. 49 (2000) 517
18. Schamm S., and Zanchi G. Ultramicroscopy 96 (2003) 559
19. Dorneich A.D., French R.H., Müllejans H., Loughin S., and Rühle M. J. Microsc. 191 3 (1998) 286
20. Jin H., Kun Oh S., and Jae Kang H. Surf. Interface Anal. 38 (2006) 1564
21. Justo J.F., de Brito Mota F., and Fazzio A. Phys. Rev. B 65 (2002) 73202
22. Guraya M.M., Ascolani H., Zampieri G., Cisneros J.I., Dias da Silva J.H., and Cantão M.P. Phys. Rev. B 42 (1990) 5677
23. Banerji N., Serra J., Chiussi S., Leon B., and Perez-Amor M. Appl. Surf. Sci. 168 (2000) 52
24. Hasegawa S., Matuura M., and Kurata Y. Appl. Phys. Lett. 49 (1986) 1272
25. Yin Z., and Smith F.W. J. Non-Cryst. Solids 137 (1991) 879
26. Bangert U., Harvey A., Davison J., Keyse R., and Dieker C. J. Appl. Phys. 83 (1998) 7726
27. Couillard M., Kociak M., Stéphan O., Botton G.A., and Colliex C. Phys. Rev. B 76 (2007) 165131