Synthesis of a fluorinated photoresist for optical waveguide devices

Applied Physics A: Materials Science and Processing

Volumn 96, Issue 2, 2009, Pages 467-472

  Fei, Xu ^a,b   Wan, Ying ^a   Zhang, Haiming ^a   Cui, Zhanchen ^a   Zhang, Daming ^a  

^a JILIN UNIVERSITY   (China)

^b DALIAN POLYTECHNIC UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

1550 NM; BISPHENOL; CHANNEL WAVEGUIDE; CHEMICAL DEVELOPMENT; DIPHENOL; EPOXY CHLOROPROPANE; GLASS TRANSITION TEMPERATURE; IODONIUM SALTS; ISOPROPYLIDENE; LOW-LOSS OPTICAL WAVEGUIDES; NOVOLAC RESIN; OPTICAL WAVEGUIDE DEVICE; PROPAGATION LOSS; TOP SURFACE; UV EXPOSURE; UV LIGHT;

CROSSLINKING; INTEGRATED OPTOELECTRONICS; OPTICAL WAVEGUIDES; PHENOLIC RESINS; PHENOLS; PHOTORESISTORS; RESINS; SPIN GLASS; SURFACE TREATMENT; SYNTHESIS (CHEMICAL); WAVEGUIDES;

GLASS TRANSITION;

EID: 67650421532     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-009-5280-5     Document Type: Article

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