Acrylated hyperbranched polymer photoresist for ultra-thick and low-stress high aspect ratio micropatterns

Journal of Micromechanics and Microengineering

Volumn 18, Issue 4, 2008, Pages

  Schmidt, Lars Erik ^a   Yi, Soyeon ^b   Jin, Young Hyun ^b   Leterrier, Yves ^a   Cho, Young Ho ^b   Månson, Jan Anders E ^a  

^a LABORATOIRE DE TECHNOLOGIE DES COMPOSITES ET POLYMÈRES LTC   (Switzerland)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MICROSTRUCTURE; MONOMERS; POLYETHERS;

HYPERBRANCHED POLYETHER; MICROBATTERY DEVICES;

PHOTORESISTS;

EID: 42549154736     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/4/045022     Document Type: Article

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