Aluminum incorporation in Ti1-x AlxN films studied by x-ray absorption near-edge structure

Journal of Applied Physics

Volumn 105, Issue 11, 2009, Pages

  Gago, R ^a,b   Redondo Cubero, A ^b,d   Endrino, J L ^a   Jimnez I ^a   Shevchenko, N ^c  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

^c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^d UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AL INCORPORATION; ALN; ALUMINUM INCORPORATION; ATOMIC STRUCTURE; CUBIC STRUCTURE; DC MAGNETRON CO-SPUTTERING; GRAZING-INCIDENCE X-RAY DIFFRACTION; LOCAL BONDING; MOLAR FRACTIONS; SOLUBILITY LIMITS; SPECTRAL FEATURE; SURFACE ENRICHMENT; TITANIUM ALUMINUM NITRIDE; TOTAL ELECTRON YIELD; X-RAY ABSORPTION NEAR-EDGE STRUCTURE; XANES;

ABSORPTION; ALUMINA; ALUMINUM NITRIDE; NITRIDES; SEGREGATION (METALLOGRAPHY); TITANIUM; TITANIUM NITRIDE; X RAY ABSORPTION; X RAY ANALYSIS;

ALUMINUM;

EID: 67649556971     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3139296     Document Type: Article

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