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Volumn , Issue , 2008, Pages 690-693

High-frequency (50-100MHz) medical ultrasound transducer arrays produced by micromachining bulk PZT materials

Author keywords

Bulk PZT; High frequency; Micromachining; Transducer array; Ultrasound

Indexed keywords

ADJACENT CHANNELS; BACKING LAYERS; BACKING MATERIALS; BULK PZT; CENTER FREQUENCY; CHLORINE-BASED PLASMA; ETCH DEPTH; ETCH RATES; HIGH FREQUENCY; HIGH FREQUENCY HF; MATCHING LAYER; MEDICAL ULTRASOUND; PARYLENE; PROCESSING TIME; PZT; PZT MATERIALS; TRANSDUCER ARRAY; ULTRASOUND; ULTRASOUND TRANSDUCER ARRAYS;

EID: 67649360320     PISSN: 10510117     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ULTSYM.2008.0166     Document Type: Conference Paper
Times cited : (16)

References (17)
  • 4
    • 33144485046 scopus 로고    scopus 로고
    • Development of a 35-MHz piezo-composite ultrasound array for medical imaging
    • J. Cannata, et al., "Development of a 35-MHz piezo-composite ultrasound array for medical imaging," IEEE Trans Ultrason Ferroelectr Freq Control, Vol.53, No. 1, pp. 224-361, 2006
    • (2006) IEEE Trans Ultrason Ferroelectr Freq Control , vol.53 , Issue.1 , pp. 224-361
    • Cannata, J.1
  • 5
    • 34848898989 scopus 로고    scopus 로고
    • Piezoelectric materials for high frequency medical imaging applications: A review
    • DOI 10.1007/s10832-007-9044-3, Special Issue on Advances in Piezoelectrics: Fundamentals, Characterization, Materials and Applications, Guest Editor: Dragan Damjanovic
    • K. Shung, J. Cannata, and Q. Zhou, "Piezoelectric materials for high frequency medical imaging applications: A review," J. Electroceram., Vol.19, pp. 139-145, 2007. (Pubitemid 47508410)
    • (2007) Journal of Electroceramics , vol.19 , Issue.1 , pp. 139-145
    • Shung, K.K.1    Cannata, J.M.2    Zhou, Q.F.3
  • 12
  • 13
    • 33646069652 scopus 로고    scopus 로고
    • High aspect ratio plasma etching of bulk lead zirconate titanate
    • S. Subasinghe, A. Goyal, and S. Tadigadapa, "High aspect ratio plasma etching of bulk lead zirconate titanate," Proc. SPIE, Vol.6109, 61090D (2006)
    • (2006) Proc. SPIE , vol.6109
    • Subasinghe, S.1    Goyal, A.2    Tadigadapa, S.3
  • 14
    • 33646913135 scopus 로고    scopus 로고
    • The profile and device characterization of high wafer temperature etched Ir/PZT/Ir stacks
    • DOI 10.1080/714040682
    • S. Marks, et al., "The profile and device characterization of high wafer temperature etched Ir/PZT/Ir stacks," Integrated Ferroelectrics, Vol.59, pp. 333-340, 2003 (Pubitemid 44798398)
    • (2003) Integrated Ferroelectrics , vol.53 , pp. 333-340
    • Marks, S.1    Almerico, J.P.2    Gay, M.K.3    Celii, F.G.4
  • 15
    • 0035271146 scopus 로고    scopus 로고
    • "Dry etching characteristics of Pb(Zr, Ti)O3 films in CF4 and Cl2/CF4 inductively coupled plasmas,"
    • J. Jung and W. Lee, "Dry etching characteristics of Pb(Zr, Ti)O3 films in CF4 and Cl2/CF4 inductively coupled plasmas," Japan J. Appl. Phys., Vol.40 Pt. 1, pp. 1408-1419, 2001
    • (2001) Japan J. Appl. Phys. , vol.40 , Issue.1 , pp. 1408-1419
    • Jung, J.1    Lee, W.2
  • 16
    • 3142697933 scopus 로고    scopus 로고
    • Etching mechanism of Pb(Zr, Ti)O3 thin films in Cl2/Ar plasma
    • A. Efremov, et al., "Etching mechanism of Pb(Zr, Ti)O3 thin films in Cl2/Ar plasma," Plasma Chemistry and Plasma Processing, Vol.24, No. 1, pp. 13-28, 2004
    • (2004) Plasma Chemistry and Plasma Processing , vol.24 , Issue.1 , pp. 13-28
    • Efremov, A.1
  • 17
    • 0035981405 scopus 로고    scopus 로고
    • Reduction of dry etching damage to PZT films etched with a Cl-based plasma and the recovery behavior
    • M. Kang, et al., "Reduction of dry etching damage to PZT films etched with a Cl-based plasma and the recovery behavior," J. of the Korean Physical Society, Vol. 41, No. 4, pp. 445-450, 2002.
    • (2002) J. of the Korean Physical Society , vol.41 , Issue.4 , pp. 445-450
    • Kang, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.