Dry etching process for Pb(Zr,Ti)O3 thin-film actuators

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 1, 2007, Pages 280-282

  Kokaze, Yutaka ^a   Kimura, Isao ^a   Endo, Mitsuhiro ^a   Ueda, Masahisa ^a   Kikuchi, Shin ^a   Nishioka, Yutaka ^a   Suu, Koukou ^a  

^a ULVAC INC   (Japan)

Author keywords

Dry etching; Inductively super magnetron plasma; Pb(Zr,Ti)O3 piezoelectricity; RF magnetron sputtering

Indexed keywords

ACTUATORS; DRY ETCHING; LEAD COMPOUNDS; MAGNETRON SPUTTERING;

INDUCTIVELY SUPER MAGNETRON PLASMA; RF MAGNETRON SPUTTERING;

THIN FILM DEVICES;

EID: 34547860089     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.280     Document Type: Article

References (14)

1. K. Suu, A. Osawa, N. Tani, M. Ishikawa, K. Nakamura, T. Ozawa, K. Sameshima, A. Kamisawa, and H. Takasu: Jpn. J. Appl. Phys. 35 (1996) 4967.
2. K. Suu, A. Osawa, Y. Nishioka, and N. Tani: Jpn. J. Appl. Phys. 36 (1997) 5789.
3. K. Suu, N. Nisioka, A. Osawa, and N. Tani: Oyo Buturi 65 (1996) 1248 [in Japanese].
4. T. Jimbo, I. Kimura, Y. Nishioka, S. Kikuchi, Y. Kokaze, M. Endo, M. Ueda, and K. Suu: Ferroelectric Materials and Their Applications, 2005, 26-P-8 [in Japanese].
5. S. Fujii, I. Kanno, T. Kamada, and R. Takayama: Jpn. J. Appl. Phys. 36 (1997) 6065.
6. T. Iijima, S. Ito, and H. Matsuda: Jpn. J. Appl. Phys. 41 (2002) 6735.
7. S. Yokoyama, Y. Honda, H. Morikawa, S. Okamoto, T. Iijima, H. Matsuda, K. Saito, and H. Funakubo: Integrated Ferroelectr. 64 (2004) 217.
8. S. Fujii, I. Kanno, T. Kanda, and R. Takayama: Jpn. J. Appl. Phys. 36 (1997) 6065.
9. H. Funakubo, S. Yokoyama, T. Ozeki, A. Nagai, and T. Oikawa: Sci. Technol. Adv. Mater. 5 (2004) 431.
10. S. Yokoyama, Y. Honda, H. Morikawa, T. Oikawa, and H. Funakubo: Appl. Phys. Lett. 83 (2004) 2408.
11. Y. Kokaze, M. Endo, M. Ueda, and K. Suu: 17th. Int. Symp. Integrated Ferroelectrics, 2005, 5-26-P.
12. K. Zheng, J. Lu, and J. Chu: Jpn. J. Appl. Phys. 43 (2004) 3934.
13. K. Saito, J. H. Choi, T. Fukuda, and M. Ohue: Jpn. J. Appl. Phys. 31 (1992) 1260.
14. I. Kimura, Y. Nishioka, S. Kikuchi, and K. Suu: J. Vac. Soc. Jpn. 49 (2006) 174.