High aspect ratio plasma etching of bulk Lead Zirconate Titanate

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6109, Issue , 2006, Pages

  Subasinghe, Srimath S ^a   Goyal, Abhijat ^a   Tadigadapa, Srinivas A ^a  

^a The Pennsylvania State University   (United States)

Author keywords

Anisotropic Etching; Bulk Micromachining; Ceramic; Dry Etching; Inductively Coupled Plasma; Lead Zirconate Titanate (PZT); Micro Electro Mechanical Systems (MEMS); Reactive Ion Etching (RIE)

Indexed keywords

ANISOTROPIC ETCHING; BULK MICROMACHINING; HARD MASKS; LEAD ZIRCONATE TITANATE (PZT);

ASPECT RATIO; CERAMIC MATERIALS; DRY ETCHING; ELECTRODEPOSITION; ELECTROMECHANICAL DEVICES; INDUCTIVELY COUPLED PLASMA; LEAD COMPOUNDS; MASKS; MICROELECTROMECHANICAL DEVICES; PIEZOELECTRIC DEVICES; REACTIVE ION ETCHING;

PLASMA ETCHING;

EID: 33646069652     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657751     Document Type: Conference Paper

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