Reduction of dry etching damage to PZT films etched with a Cl-based plasma and the recovery behavior

Journal of the Korean Physical Society

Volumn 41, Issue 4, 2002, Pages 445-450

  Kang, Myoung Gu ^a   Kim, Kyoung Tae ^a   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

Etch; ICP; Plasma damage; PZTM; XPS

Indexed keywords

EID: 0035981405     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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