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Applied Physics Letters

Volumn 94, Issue 13, 2009, Pages

All dielectric hard x-ray mirror by atomic layer deposition

(5) Szeghalmi, Adriana a Senz, Stephan a Bretschneider, Mario b Gösele, Ulrich a Knez, Mato a

a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS (Germany)

b IfG Institute for Scientific Instruments GmbH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCES; ATOMIC LAYERS; HARD X-RAY MIRRORS; HARD X-RAYS; NANO-LAMINATES; SHARP INTERFACES; SMOOTH SURFACES; TEM; TEM IMAGES; THICKNESS VARIATIONS; X-RAY REFLECTIVITIES;

ATOMS; DIELECTRIC MATERIALS; MIRRORS; REFLECTION; TANTALUM;

TRANSMISSION ELECTRON MICROSCOPY;

EID: 64149102371 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3114402 Document Type: Article

Times cited : (21)

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