High-speed atomic force microscope lithography using a piezo tube scanner driven by a sinusoidal waveform

Ultramicroscopy

Volumn 109, Issue 8, 2009, Pages 1052-1055

  Kwon, Gwangmin ^a   Kim, Sang Hyun ^a   Jeong, Meehye ^a   Han, Seung Heon ^b   Choi, Chang Son ^b   Han, Seung Jin ^b   Hong, Jaewan ^c   Lee, Haiwon ^a  

^a Hanyang University   (South Korea)

^b Doosan Mecatec Co Ltd   (South Korea)

^c NanoFocus Inc   (South Korea)

Author keywords

AFM lithography; Nanolithography; Organic resists; Photo acid generator; Sinusoidal waveform signal

Indexed keywords

AFM; AFM LITHOGRAPHY; ATOMIC FORCE MICROSCOPE LITHOGRAPHY; ATOMIC FORCE MICROSCOPES; CROSS-LINKED POLYMERS; HIGH-SPEED; HIGHLY SENSITIVE; LINE PATTERN; MECHANICAL INSTABILITIES; ORGANIC RESIST; ORGANIC RESISTS; PHOTO ACID GENERATOR; PHOTOACID GENERATORS; SINUSOIDAL WAVEFORM SIGNAL; SINUSOIDAL WAVEFORMS; SUCCESS FACTORS; TUBE SCANNER; TURNING POINTS;

ATOMIC FORCE MICROSCOPY; ATOMS; NANOLITHOGRAPHY;

SCANNING;

NANOMATERIAL;

ARTICLE; ARTIFACT REDUCTION; ATOMIC FORCE MICROSCOPY; CONTROLLED STUDY; CROSS LINKING; IMAGE QUALITY; MECHANICAL STRESS; MOLECULAR DYNAMICS; NANOFABRICATION; NANOTECHNOLOGY; PIEZOELECTRICITY; WAVEFORM;

EID: 67649126232     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2009.03.021     Document Type: Article

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