Growth characteristics evaluations on the 3D nanostructure fabrication by the high accuracy control of focused-ion-beam

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 552-555

  Kometani, Reo ^a   Hoshino, Takayuki ^b   Warisawa, Shin'ichi ^a   Ishihara, Sunao ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Adsorbed gas; Downward growth; Focused ion beam (FIB); Focused ion beam chemical vapor deposition (FIB CVD); Growth characteristics; Proximity effect; Three dimensional (3D) nanostructures

Indexed keywords

ADSORBED GAS; DOWNWARD GROWTH; FOCUSED-ION-BEAM (FIB); FOCUSED-ION-BEAM CHEMICAL VAPOR DEPOSITION (FIB-CVD); GROWTH CHARACTERISTICS; PROXIMITY EFFECT; THREE-DIMENSIONAL (3D) NANOSTRUCTURES;

COMMINUTION; DIAMOND LIKE CARBON FILMS; FABRICATION; FOCUSED ION BEAMS; IONS; IRRADIATION; NANOSTRUCTURES; THREE DIMENSIONAL; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 67349270551     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.01.037     Document Type: Article

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