Quantitative study of the Si/SiO2 phase separation in substoichiometric silicon oxide films

Materials Science and Engineering: B

Volumn 159-160, Issue C, 2009, Pages 80-82

  Nicotra, G ^a   Spinella, C ^a   La Magna, A ^a   Bongiorno, C ^a   Rimini, E ^a,b  

^a CNR   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

EELS; EFTEM; Si QDs; SRO; STEM

Indexed keywords

AGGLOMERATION; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; OXIDE FILMS; PHASE SEPARATION; SILICON OXIDES; STRAIN ENERGY;

CHEMICAL VAPOR DEPOSITED; DEPOSITION PARAMETERS; EFTEM; QUANTITATIVE STUDY; SI QD; SILICON NANOCLUSTERS; SILICON OXIDE FILMS; SRO; STEM; SYSTEMATIC STUDY;

SILICA;

EID: 67349259706     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.10.045     Document Type: Article

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