Microstructural evolution of SiOx films and its effect on the luminescence of Si nanoclusters

Journal of Applied Physics

Volumn 104, Issue 9, 2008, Pages

  Franz, G ^a   Miritello, M ^a   Boninelli, S ^a   Lo Savio, R ^a   Grimaldi, M G ^a   Priolo, F ^a   Iacona, F ^b   Nicotra, G ^b   Spinella, C ^b   Coffa, S ^c  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR IMM   (Italy)

^c STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ANNEALING; CHEMICAL PROPERTIES; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; LIGHT EMISSION; LUMINESCENCE; MAGNETRON SPUTTERING; MICROSCOPIC EXAMINATION; NANOCLUSTERS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; OPTICAL PROPERTIES; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; SILICON;

ANNEALING TEMPERATURES; DEPOSITED FILMS; PL INTENSITIES; REDSHIFTED; SI NANOCLUSTERS; SPUTTERED FILMS; THERMAL ANNEALING;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 56349131888     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3006735     Document Type: Article

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