Role of the internal strain on the incomplete SiSi O2 phase separation in substoichiometric silicon oxide films

Applied Physics Letters

Volumn 90, Issue 18, 2007, Pages

  La Magna, A ^a   Nicotra, G ^a   Bongiorno, C ^a   Spinella, C ^a   Grimaldi, M G ^b   Rimini, E ^b   Caristia, L ^c   Coffa, S ^c  

^a CNR   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

^c STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FREE ENERGY; NANOCLUSTERS; PHASE SEPARATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; STRAIN ENERGY; TRANSMISSION ELECTRON MICROSCOPY;

ENERGY FILTERED TRANSMISSION ELECTRON MICROSCOPY; FREE ENERGY DIFFERENCE; INTERNAL STRAIN;

THIN FILMS;

EID: 34247862337     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2734398     Document Type: Article

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