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Volumn 86, Issue 4-6, 2009, Pages 646-649
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Step and flash imprint lithography for quantum dots based room temperature single electron transistor fabrication
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Author keywords
Focused ion beam; Nanoimprint; Nanowire; Room temperature single electron transistors; Step and flash imprint lithography
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Indexed keywords
DEPOSITION TECHNIQUES;
FOCUS ION BEAMS;
MONOLITHICALLY INTEGRATED;
NANO-ELECTRONICS;
NANOIMPRINT;
PROCESS FLOWS;
QD-BASED DEVICES;
QUANTUM DOT ARRAYS;
QUANTUM DOTS;
ROOM TEMPERATURE SINGLE ELECTRON TRANSISTORS;
STEP AND FLASH IMPRINT LITHOGRAPHY;
ULTRA-LOW-POWER;
ELECTRONS;
FOCUSED ION BEAMS;
IONS;
MONOLITHIC INTEGRATED CIRCUITS;
NANOWIRES;
OPTICAL WAVEGUIDES;
SEMICONDUCTOR QUANTUM DOTS;
TRANSIENTS;
TRANSISTORS;
TUNGSTEN;
NANOIMPRINT LITHOGRAPHY;
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EID: 67349128057
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2008.12.094 Document Type: Article |
Times cited : (15)
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References (15)
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