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Volumn 86, Issue 4-6, 2009, Pages 646-649

Step and flash imprint lithography for quantum dots based room temperature single electron transistor fabrication

Author keywords

Focused ion beam; Nanoimprint; Nanowire; Room temperature single electron transistors; Step and flash imprint lithography

Indexed keywords

DEPOSITION TECHNIQUES; FOCUS ION BEAMS; MONOLITHICALLY INTEGRATED; NANO-ELECTRONICS; NANOIMPRINT; PROCESS FLOWS; QD-BASED DEVICES; QUANTUM DOT ARRAYS; QUANTUM DOTS; ROOM TEMPERATURE SINGLE ELECTRON TRANSISTORS; STEP AND FLASH IMPRINT LITHOGRAPHY; ULTRA-LOW-POWER;

EID: 67349128057     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.094     Document Type: Article
Times cited : (15)

References (15)
  • 2
    • 0030570065 scopus 로고    scopus 로고
    • Chou S.Y., et al. Science 272 (1996) 85-87
    • (1996) Science , vol.272 , pp. 85-87
    • Chou, S.Y.1
  • 8
    • 67349266297 scopus 로고    scopus 로고
    • Nanotechnology 2008
    • D. Cheam et al., Nanotechnology 2008, in: Eighth IEEE Conference, vol. 18-21, 2008, pp. 175-178
    • (2008) Eighth IEEE Conference , vol.18-21 , pp. 175-178
    • Cheam, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.