EUVL readiness for pilot line insertion

Solid State Technology

Volumn 52, Issue 2, 2009, Pages 14-19

  Wurm, S ^a   Goodwin, F ^a   Yun, H ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-POWER SOURCES; IC MANUFACTURERS; NEW BUSINESS MODELS; PILOT LINES;

OCCUPATIONAL RISKS;

EID: 62649106743     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (10)

1. International Technology Roadmap for Semiconductors, http://public.itrs. net/.
2. 2008 International Symposium on Extreme Ultraviolet Lithography, September 28 October 1, 2008, Lake Tahoe, California; http://www.sematech.org/ meetings/archives.htm#litho.
3. 2008 SEMATECH EUV Source Workshop, May 12, 2008, Bolton Landing, New York; http://www.sematech.org/meetings/archives.htm#litho.
4. International EUV Imitative Source Technical Working Group, October 2, Lake Tahoe, 2008, California; www.ieuvi.org.
5. D.C. Brandt et al. in réf. #2.
6. D.C. Brandt et al., Laser Produced Plasma Source System Development, SPIE Lithography Asia, November 2-4, 2008, Taipei, Taiwan.
7. International EUV Imitative Mask Technical Working Group, October 2, Lake Tahoe, 2008, California; www.ieuvi.org.
8. C. Koh et al. in ref. #2.
9. H. Meiling et al. in ref. #2.
10. R. Brainard et al., J. Photopolymer Sci. Tech. 21 (3), 457 (2008).