Experimental evaluation of out-of-plane distortion of electrostatically chucked EUV reticle

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Ota, Kazuya ^a   Taguchi, Takao ^a   Amemiya, Mitsuaki ^a   Nishiyama, Yasushi ^a   Kamono, Takashi ^a   Nishimura, Naosuke ^a   Takikawa, Tadahiko ^a   Usui, Youichi ^a   Suga, Osamu ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Electrostatic chuck; EUVL; Mask handling; Particle

Indexed keywords

CHUCKED RETICLES; CRITICAL ISSUES; ELECTROSTATIC CHUCKS; ENGINEERING TOOLS; EXPERIMENTAL EVALUATION; EXPERIMENTAL SETUP; FRONT SURFACES; IN-PLANE DISTORTIONS; OUT-OF-PLANE DISTORTIONS; REPRODUCIBILITIES; VACUUM CHAMBERS;

CHUCKS; ELECTROSTATICS; EXTREME ULTRAVIOLET LITHOGRAPHY; IMAGE QUALITY; PHOTOMASKS; VACUUM; X RAY LITHOGRAPHY;

OPTICAL INSTRUMENTS;

EID: 67149122317     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771339     Document Type: Conference Paper

References (8)

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