Development of EUV mask handling technology at MIRAI-Selete

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Ota, Kazuya ^a   Amemiya, Mitsuaki ^a   Taguchi, Takao ^a   Kamono, Takashi ^a   Kubo, Hiroyoshi ^a   Takikawa, Tadahiko ^a   Usui, Youichi ^a   Suga, Osamu ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUVL; Mask handling; Particle; Particle inspection

Indexed keywords

DEFECTS; PHOTOMASKS; SENSITIVITY ANALYSIS;

BLANK FLIPPING MECHANISM; MASK HANDLING; PARTICLE INSPECTION;

EXTREME ULTRAVIOLET LITHOGRAPHY;

DEFECTS; LITHOGRAPHY; MASKING;

EID: 35148886290     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711317     Document Type: Conference Paper

References (10)

1. K. Ota, "A New Concept of EUV Reticle Particle Protection in Handling and New Carrier Standard Proposal", EUV Mask Workshop, Miyazaki, Japan, 01 November 2004.
2. Brian Blum, "Reticle Handling Concept", EUV Mask & Chuck AND EUV Mask Handling Standards Working Groups Meetings, Santa Clara, California, USA, 23 February 2003.
3. Arun Ramamoorthy, Kevin Orvek and Pei-Yang Yan, "Removable pellicle and protection methods and reticle handling activities at Intel", EUV Mask Workshop, Miyazaki, Japan, 01 November 2004.
4. Long Hei, Kevin Orvek and Stefan Wurm, "Update of SEMATECH EUV Reticle Handling and Protection Activities", EUV Mask Carrier and Load Port Standards Workshop, Santa Clara, California, USA, 19 February 2006.
5. J. Urbach, J. Cavelaars, H. Kusunose, T. Liang, and A. R. Stivers, "EUV substrate and blank inspection with confocal microscopy" Proc. of SPIE Vol. 5256, pp 556-565, 2003
6. Ichiro Okabe, Balaji Kannan, Rebekah K. Ligman, Emily Y. Shu, Pei-yan Yan and Arun Ramamoorthy, "EUV Mask Chucking Study - Defect Mitigation and Dynamic Flatness", EUVL 2004 Symposium, Miyazaki, Japan, November 2004.
7. T. Takatsuji, N. Ueki, K. Hibino, S. Osawa, and T. Kurosawa, "Japanese ultimate flatness interferometer (FUJI) and its preliminary experiment," Proc. SPIE 4401, 83 (2001).
8. T. Takatsuji, S. Osawa, Y. Kuriyama, and T. Kurosawa, "Stability of the reference flat used in Fizeau interferometer and its contribution to measurement uncertainty," Proc. SPIE 5190, 431 (2003).
9. R. Tejeda, R. Engelstad, E. Lovell, K. Blaedel, "Particle-induced distortion in extreme ultraviolet lithography reticles during exposure chucking", Journal of Vacuum Science and Technology B, Vol. 20, Iss. 6, pg 2840-2843, Nov/Dec 2002.
10. Rebekah K Ligman, Emily Y. Shu and Pei-yang Yan, "Characterization of Electrostatically Chucked EUVL Mask Blanks", Proceedings of SPIE Vol. 5751, pp 640-650, Feb/Mar2005.