Japanese ultimate flatness interferometer (FUJI) and its preliminary experiment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4401, Issue , 2001, Pages 83-90

  Takatsuji, Toshiyuki ^a   Ueki, Nobuaki ^b   Hibino, Kenichi ^a   Osawa, Sonko ^a   Kurosawa, Tomizo ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Fuji Photo Optical Co Ltd   (Japan)

Author keywords

Fizeau interferometer; Flatness; International comparison; Phase shifting; Silicon wafer

Indexed keywords

FUSED SILICA; HELIUM NEON LASERS; IMAGING SYSTEMS; OPTICAL BEAM SPLITTERS; OPTICAL DESIGN; OPTICAL SYSTEMS; OPTICAL TESTING; OPTICAL VARIABLES MEASUREMENT; SCANNING; SILICON WAFERS; SINGLE MODE FIBERS; SPATIAL VARIABLES MEASUREMENT;

FIZEAU INTERFEROMETER; FLATNESS MEASUREMENT; INTERNATIONAL COMPARISON; OPTICAL FLATS; PHASE SHIFTING; ULTIMATE FLATNESS INTERFEROMETER;

INTERFEROMETERS;

EID: 0035761634     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.445643     Document Type: Article

References (1)

1. Phillip S. Fairman, et. al, "300-mm-aperture phase-shifting Fizeau intgerferomete," Opt. Eng. 38, pp. 1371-1380, 1999.