Thermal stability of W-xRe/TiC/SiC systems (x = 0, 5 and 25 at % Re) at high temperature

Advanced Engineering Materials

Volumn 11, Issue 5, 2009, Pages 399-407

  Roger, Jerome ^a,b   Audubert, Fabienne ^b   Le Petitcorps, Yann ^a  

^a UNIVERSITÉ DE BORDEAUX   (France)

^b IRFM   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY ALLOYS; CARBIDES; CHEMICAL VAPOR DEPOSITION; DIFFUSION; REACTION KINETICS; SILICIDES; SILICON CARBIDE; THERMODYNAMIC STABILITY; TITANIUM CARBIDE;

ATOMIC CONCENTRATION; CONSTANT FLOW; DEPOSITION EXPERIMENTS; DIFFUSION COUPLE; DIFFUSION KINETICS; HIGH TEMPERATURE; NORMAL PRESSURE; REACTION SCHEMES;

SUBSTRATES;

EID: 67049146382     PISSN: 14381656     EISSN: 15272648     Source Type: Journal    
DOI: 10.1002/adem.200800354     Document Type: Article

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