Nanocrystalline diamond/β-SiC composite interlayers for the deposition of continuous diamond films on W and Mo substrate materials

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 8981-8985

  Srikanth Vadali, V S S ^a   Samra, Hisham Abu ^a   Staedler, Thorsten ^a   Jiang, Xin ^a  

^a UNIVERSITY OF SIEGEN   (Germany)

Author keywords

Adhesion and metals; Diamond; Gradient films; Interlayers; Nanocomposite

Indexed keywords

ADHESION; CRYSTAL STRUCTURE; DIAMOND FILMS; FILM GROWTH; GAS MIXTURES; MOLYBDENUM; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE MORPHOLOGY; TUNGSTEN;

GRADIENT COMPOSITE INTERLAYERS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;

COMPOSITE FILMS;

ADHESION; COMPOSITE FILMS; CRYSTAL STRUCTURE; DIAMOND FILMS; FILM GROWTH; GAS MIXTURES; MOLYBDENUM; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE MORPHOLOGY; TUNGSTEN;

EID: 34547668742     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.018     Document Type: Article

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