Nonlinear optical response of nc-Si-SiO2 films studied with femtosecond four-wave mixing technique

Chinese Physics Letters

Volumn 23, Issue 11, 2006, Pages

  Guo, Heng Qun ^a   Wang, Qi Ming ^b  

^a HUAQIAO UNIVERSITY   (China)

^b INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FOUR WAVE MIXING; OPTICAL PROPERTIES; SILICON OXIDES;

FEMTOSECONDS; FOUR-WAVE-MIXING; MIXING TECHNIQUES; NONLINEAR OPTICAL PROPERTIES; NONLINEAR OPTICAL RESPONSE; RESONANT NONLINEARITY; SILICON NANOCRYSTALS; THIRD-ORDER NONLINEAR SUSCEPTIBILITY; TIME-RESOLVED FOUR-WAVE MIXING;

SILICA;

EID: 33846167148     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/23/11/029     Document Type: Article

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