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Volumn 9, Issue 6, 2009, Pages 2234-2238

Self-aligned nanolithography in a nanogap

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL CHARACTERIZATION; ELECTRICAL CONTACTS; FUNCTIONAL NANOSTRUCTURES; NANO DEVICE; NANO SCALE; NANO-ELECTRODES; NANO-GAP; NANOGAP ELECTRODES; NANOHOLES; NANOISLAND; POLYMER RESIST; ROOM TEMPERATURE; SELF-ALIGNED; TUNNELING CHARACTERISTICS; TUNNELING JUNCTIONS; VARIABLE DIAMETER; VIA HOLE;

EID: 66749139035     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl9000597     Document Type: Article
Times cited : (16)

References (36)
  • 2
    • 0035451899 scopus 로고    scopus 로고
    • Lieber, C. M. Sci. Am. 2001, 285, 50-56.
    • (2001) Sci. Am , vol.285 , pp. 50-56
    • Lieber, C.M.1
  • 17
    • 66749182770 scopus 로고    scopus 로고
    • Leica VB6 HR and Jeol JBX 9300 FS EBL Equipment Capability.
    • Leica VB6 HR and Jeol JBX 9300 FS EBL Equipment Capability.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.