Effects of pulse bias duty cycle on fullerenelike nanostructure and mechanical properties of hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition method

Journal of Applied Physics

Volumn 105, Issue 10, 2009, Pages

  Ji, Li ^a,b   Li, Hongxuan ^a   Zhao, Fei ^a   Quan, Weilong ^a   Chen, Jianmin ^a   Zhou, Huidi ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DUTY CYCLES; FULLERENE-LIKE NANOSTRUCTURES; FULLERENE-LIKE STRUCTURES; HYDROGEN REMOVAL; HYDROGENATED CARBON FILMS; INTERNAL STRESS; MICROSTRUCTURE AND MECHANICAL PROPERTIES; PULSE DUTY CYCLE;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROGEN; HYDROGENATION; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; MECHANICAL PROPERTIES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRESSES; VAPORS;

CARBON FILMS;

EID: 66549100279     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3125528     Document Type: Article

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