Electrochemical nucleation and growth of copper from acidic sulfate electrolytes on n-Si(001)

Journal of the Electrochemical Society

Volumn 154, Issue 7, 2007, Pages

  Shao, W ^a,b   Pattanaik, G ^a,b   Zangari, G ^a,b  

^a UNIVERSITY OF VIRGINIA   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDIC SULFATE; DEPOSITION OVERPOTENTIAL; ISLAND COARSENING; ROOM TEMPERATURE;

ADSORPTION; ELECTROLYTES; INTERFACES (MATERIALS); NUCLEATION; OSTWALD RIPENING; REDUCTION; SILICON; SURFACE DIFFUSION;

COPPER;

EID: 34249900173     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2733813     Document Type: Article

References (32)

1. P. C. Andricacos, C. Uzoh, J. O. Dukovic, J. Horkans, and H. Deligianni, IBM J. Res. Dev., 42, 567 (1998).
2. J. D. Reid, Jpn. J. Appl. Phys., Part 1, 40, 2650 (2001).
3. E. I. Cooper, C. Bonhote, J. Heidmann, Y. Hsu, P. Kern, J. W. Lam, M. Ramasubramanian, N. Robertson, L. T. Romankiw, and H. Xu, IBM J. Res. Dev., 49, 103 (2005).
4. P. C. Andricacos and N. Robertson, IBM J. Res. Dev., 42, 671 (1998).
5. M. E. Hyde and R. G. Compton, J. Electroanal. Chem., 549, 1 (2003).
6. M. J. Williamson, R. M. Tromp, P. M. Vereecken, R. Hull, and F. M. Ross, Nat. Mater., 2, 532 (2003).
7. A. Radisic, P. M. Vereecken, J. B. Hannon, P. C. Searson, and F. M. Ross, Nano Lett., 6, 238 (2006).
8. A. Radisic, F. M. Ross, and P. C. Searson, J. Phys. Chem. B, 110, 7862 (2006).
9. M. E. Hyde, R. Jacobs, and R. G. Compton, J. Phys. Chem. B, 106, 11075 (2002).
10. J. W. Dini, in Modern Electroplating, 4th ed., M. Schlesinger, M. Paunovic, Editors, p. 61, Wiley, New York (2001).
11. D. M. Soares, S. Wasle, K. G. Weil, and K. Doblhofer, J. Electrochem. Soc., 532, 353 (2002).
12. W. Shao, G. Pattanaik, and G. Zangari, J. Electrochem. Soc., 154, D201 (2007).
13. C. Ji, G. Oskam, and P. C Searson, J. Electrochem. Soc., 148, C746 (2001).
14. A. Radisic, A. C. West, and P. C. Searson, J. Electrochem. Soc., 149, C94 (2002).
15. E. Budevski, G. Staikov, and W. J. Lorenz, Electrochemical Phase Formation and Growth, VCH, Weinheim (1996).
16. B. R. Scharifker and G. J. Hills, Electrochim. Acta, 28, 879 (1983).
17. P. M. Hoffmann, A. Radisic, and P. C. Searson, J. Electrochem. Soc., 147, 2576 (2000).
18. R. N. Dixon and I. L. Roberston, Mol. Phys., 36, 1099 (1978).
19. M. O. Aboelfotoh, A. Cros, B. G. Svensson, and K. N. Tu, Phys. Rev. B, 41, 9819 (1990).
20. K. Tatsumura, T. Watanable, K. Hara, T. Hoshino, and I. Ohdomari, Phys. Rev. B, 64, 115406 (2001).
21. P. Allongue and E. Souteyrand, J. Electroanal. Chem. Interfacial Electrochem., 286, 217 (1990).
22. A. Radisic, J. G. Long, P. M. Hoffmann, and P. C. Searson, J. Electrochem. Soc., 148, C41 (2001).
23. D. Grujicic and B. Pesic, Electrochim. Acta, 50, 4426 (2005).
24. L. Bachmann, D. L. Sawyer, and B. M. Siegel, J. Appl. Phys., 36, 304 (1965).
25. J. G. Skoferonick and W. B. Phillips, J. Appl. Phys., 38, 4791 (1967).
26. M. Vicanek and N. M. Ghoniem, Thin Solid Films, 207, 90 (1992).
27. J. Erlebacher, J. Electrochem. Soc., 151, C614 (2004).
28. A. Dursun, D. V. Pugh and S. G. Corcoran, J. Electrochem. Soc., 150, B355 (2003).
29. D. J. Trevor, C. E. D. Chidesy, and D. N. Loiacono, Phys. Rev. Lett., 62, 929 (1989).
30. S. Wu, J. Lipkowski, T. Tyliszczak, and A. P Hitchcock, Prog. Surf. Sci., 50, 227 (1995).
31. T. P. Moffat, J. Phys. Chem. B, 102, 10020 (1998).
32. T. P. Moffat, Mater. Res. Soc. Symp. Proc., 45, 75 (1997).