-
1
-
-
33646031746
-
-
Cui, Y.; Duan, X.; Hu, J.; Lieber, C. M. J. Phys. Chem. B 2000, 5213.
-
(2000)
J. Phys. Chem. B
, pp. 5213
-
-
Cui, Y.1
Duan, X.2
Hu, J.3
Lieber, C.M.4
-
2
-
-
0037122167
-
-
Wang, D.; Dai, H. Angew. Chem., Int. Ed. 2002, 41, 4783.
-
(2002)
Angew. Chem., Int. Ed
, vol.41
, pp. 4783
-
-
Wang, D.1
Dai, H.2
-
3
-
-
4544373599
-
-
Wang, D.; Chang, Y.; Dai, H. J. Am. Chem. Soc. 2004, 126, 11602.
-
(2004)
J. Am. Chem. Soc
, vol.126
, pp. 11602
-
-
Wang, D.1
Chang, Y.2
Dai, H.3
-
4
-
-
0035831837
-
-
Cui, Y.; Lauhon, L. J; Gudiksen, M. S.; Wang, J.; Lieber, C. M. Appl. Phys. Lett. 2001, 2214.
-
(2001)
Appl. Phys. Lett
, pp. 2214
-
-
Cui, Y.1
Lauhon, L.J.2
Gudiksen, M.S.3
Wang, J.4
Lieber, C.M.5
-
5
-
-
0034511724
-
-
Yu, J.-Y.; Chung, S.-W.; Heath, J. R. J. Phys. Chem. B 2000, 104, 11864.
-
(2000)
J. Phys. Chem. B
, vol.104
, pp. 11864
-
-
Yu, J.-Y.1
Chung, S.-W.2
Heath, J.R.3
-
7
-
-
66549102820
-
-
Wu, Y.; Cui, Y.; Huynh, L.; Barrelet, C. J.; Bell, D. C.; Lieber, C. M. Nano Lett. 2004, 433.
-
(2004)
Nano Lett
, pp. 433
-
-
Wu, Y.1
Cui, Y.2
Huynh, L.3
Barrelet, C.J.4
Bell, D.C.5
Lieber, C.M.6
-
9
-
-
2942640234
-
-
Greytak, A. B.; Lauhon, L. J.; Gudiksen, M. S.; Lieber, C. M. Appl. Phys. Lett. 2004, 4176.
-
(2004)
Appl. Phys. Lett
, pp. 4176
-
-
Greytak, A.B.1
Lauhon, L.J.2
Gudiksen, M.S.3
Lieber, C.M.4
-
11
-
-
66549086255
-
-
Clark, T. E.; Nimmatoori, P.; Les, K.-K.; Redwing, J. M.; Dickey, E. C. Nano Lett. 2008, 1246.
-
(2008)
Nano Lett
, pp. 1246
-
-
Clark, T.E.1
Nimmatoori, P.2
Les, K.-K.3
Redwing, J.M.4
Dickey, E.C.5
-
12
-
-
66549121632
-
-
Adu, K.; Gutierrez, H.; Chen, G.; Lew, K.-K.; Nimmatoori, P.; Zhang, X.; Dickey, E.; Redwing, J.; Eklund, P.; Lu, Q. J. Phys. Chem. 2008, 3205.
-
(2008)
J. Phys. Chem
, pp. 3205
-
-
Adu, K.1
Gutierrez, H.2
Chen, G.3
Lew, K.-K.4
Nimmatoori, P.5
Zhang, X.6
Dickey, E.7
Redwing, J.8
Eklund, P.9
Lu, Q.10
-
13
-
-
66549121400
-
-
Kim, S.; Shuford, K. L.; Bok, H.-M.; Kim, S. K.; Park, S. Nano Lett. 2008, 800.
-
(2008)
Nano Lett
, pp. 800
-
-
Kim, S.1
Shuford, K.L.2
Bok, H.-M.3
Kim, S.K.4
Park, S.5
-
14
-
-
34548225613
-
-
Kim, C.-J.; Yang, J.-E.; Lee, H.-S.; Jang, H. M.; Park, W.-H.; Kim, Z. H.; Maeng, S.; Jo, M.-H. Appl. Phys. Lett. 2007, 033104.
-
(2007)
Appl. Phys. Lett
, pp. 033104
-
-
Kim, C.-J.1
Yang, J.-E.2
Lee, H.-S.3
Jang, H.M.4
Park, W.-H.5
Kim, Z.H.6
Maeng, S.7
Jo, M.-H.8
-
15
-
-
58949102645
-
-
Yang, W. F.; Lee, S. J.; Liang, G. C.; Whang, S. J.; Kwong, D. L. Nanotechnology 2008, 225203.
-
(2008)
Nanotechnology
, pp. 225203
-
-
Yang, W.F.1
Lee, S.J.2
Liang, G.C.3
Whang, S.J.4
Kwong, D.L.5
-
16
-
-
79958187283
-
-
Huxtable, S. T.; Abramson, A. R.; Tien, C.-L.; Majumdar, A.; LaBounty, C.; Fan, X.; Zeng, G.; Bowers, J. E.; Shakouri, A.; Croke, E. T. Appl. Phys. Lett. 2002, 80, 1737.
-
(2002)
Appl. Phys. Lett
, vol.80
, pp. 1737
-
-
Huxtable, S.T.1
Abramson, A.R.2
Tien, C.-L.3
Majumdar, A.4
LaBounty, C.5
Fan, X.6
Zeng, G.7
Bowers, J.E.8
Shakouri, A.9
Croke, E.T.10
-
17
-
-
85165782071
-
-
Bauer, M.; Schollhorn, C.; Lyutovich, K.; Kasper, E.; Jutzi, M.; Berroth, M. Mater. Sci. Eng. B 2002, 89,77.
-
(2002)
Mater. Sci. Eng. B
, vol.89
, Issue.77
-
-
Bauer, M.1
Schollhorn, C.2
Lyutovich, K.3
Kasper, E.4
Jutzi, M.5
Berroth, M.6
-
20
-
-
66549086748
-
-
Kharche, N.; Luisier, M.; Boykin, B. T.; Klimeck, G. J. Comput. Electron. 2008, 7, 1569.
-
(2008)
J. Comput. Electron
, vol.7
, pp. 1569
-
-
Kharche, N.1
Luisier, M.2
Boykin, B.T.3
Klimeck, G.4
-
22
-
-
0345869688
-
-
Lew, K.; Pan, L.; Dickey, E. C.; Redwing, J. M. Adv. Mater. 2003, 15, 2073.
-
(2003)
Adv. Mater
, vol.15
, pp. 2073
-
-
Lew, K.1
Pan, L.2
Dickey, E.C.3
Redwing, J.M.4
-
23
-
-
36248930048
-
-
Zhang, X.; Lew, K.; Nimmatoori, P.; Redwing, J. M.; Dickey, E. C. Nano Lett. 2007, 7, 3241.
-
(2007)
Nano Lett
, vol.7
, pp. 3241
-
-
Zhang, X.1
Lew, K.2
Nimmatoori, P.3
Redwing, J.M.4
Dickey, E.C.5
-
24
-
-
33846383071
-
-
Yang, J.; Jim, C.; Kim, C.; Jo, M. Nano Lett. 2006, 6, 2679.
-
(2006)
Nano Lett
, vol.6
, pp. 2679
-
-
Yang, J.1
Jim, C.2
Kim, C.3
Jo, M.4
-
25
-
-
37549034599
-
-
Kawashima, T.; Imamura, G.; Fujii, M.; Hayashi, S.; Saitoh, T.; Komori, K. J. Appl. Phys. 2007, 102, 124307.
-
(2007)
J. Appl. Phys
, vol.102
, pp. 124307
-
-
Kawashima, T.1
Imamura, G.2
Fujii, M.3
Hayashi, S.4
Saitoh, T.5
Komori, K.6
-
26
-
-
66549085748
-
-
GaAs substrates were used for the SIMS measurements only. Neither Ga nor As impurities were found by EDX analysis in the SiGeNWs grown on GaAs substrates
-
GaAs substrates were used for the SIMS measurements only. Neither Ga nor As impurities were found by EDX analysis in the SiGeNWs grown on GaAs substrates.
-
-
-
-
27
-
-
66549097848
-
-
Tapering rate was measured by HRTEM in the following manner. First, the diameter versus length at a few points along the NW was measured (when Au tips were used to define the growth direction). The diameter difference between two successive points was divided by their distance from each other to calculate the tapering per length unit; 6-8 tapering rate measurements were taken along each NW and finally averaged. Each growth average tapering-rate and error bars were defined by averaging the tapering rate over 8-10 NW per growth.
-
Tapering rate was measured by HRTEM in the following manner. First, the diameter versus length at a few points along the NW was measured (when Au tips were used to define the growth direction). The diameter difference between two successive points was divided by their distance from each other to calculate the tapering per length unit; 6-8 tapering rate measurements were taken along each NW and finally averaged. Each growth average tapering-rate and error bars were defined by averaging the tapering rate over 8-10 NW per growth.
-
-
-
-
28
-
-
33947523168
-
-
Qi, C.; Goncher, G.; Solanki, R.; Jordan, J. Nanotechnology. 2007, 18, 075302.
-
(2007)
Nanotechnology
, vol.18
, pp. 075302
-
-
Qi, C.1
Goncher, G.2
Solanki, R.3
Jordan, J.4
-
29
-
-
33846480471
-
-
Schmidt, V.; Senz, S.; Gosele, U. Phys. Rev. B2007, 75, 045335.
-
(2007)
Phys. Rev. B
, vol.75
, pp. 045335
-
-
Schmidt, V.1
Senz, S.2
Gosele, U.3
-
31
-
-
23144456810
-
-
Johansson, J.; Svensson, C. P. T.; Mårtensson, T.; Samuelson, L.; Seifert, W. J. Phys. Chem. B 2005, 109, 13567.
-
(2005)
J. Phys. Chem. B
, vol.109
, pp. 13567
-
-
Johansson, J.1
Svensson, C.P.T.2
Mårtensson, T.3
Samuelson, L.4
Seifert, W.5
-
32
-
-
47149085278
-
-
Zhao, H.; Zhou, S.; Hasanali, Z.; Wang, D. J. Phys. Chem. C 2008, 5695.
-
(2008)
J. Phys. Chem. C
, pp. 5695
-
-
Zhao, H.1
Zhou, S.2
Hasanali, Z.3
Wang, D.4
-
35
-
-
0030214222
-
-
Simka, H.; Hierlemann, M.; Utz, M.; Jensen, K. F. J. Electrochem. Soc. 1996, 2646.
-
(1996)
J. Electrochem. Soc
, pp. 2646
-
-
Simka, H.1
Hierlemann, M.2
Utz, M.3
Jensen, K.F.4
-
39
-
-
66549107349
-
-
Kamins, T. I.; Li, X.; Stanley Williams, R.; Liu, X. Nano Lett. 2004, 503.
-
(2004)
Nano Lett
, pp. 503
-
-
Kamins, T.I.1
Li, X.2
Stanley Williams, R.3
Liu, X.4
-
40
-
-
36248992277
-
-
Adhikari, H.; McIntyre, P. C.; Marshall, A. F.; Chidsey, C. E. D. J. Appl. Phys. 2007, 094311.
-
(2007)
J. Appl. Phys
, pp. 094311
-
-
Adhikari, H.1
McIntyre, P.C.2
Marshall, A.F.3
Chidsey, C.E.D.4
|