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Volumn 21, Issue 17, 2009, Pages 1700-1706

Is there a ZnO face stable to atomic hydrogen?

(6) Bruno, Giovanni a Giangregorio, Maria Michela a Malandrino, Graziella b Capezzuto, Pio a Fragalà, Ignazio L b Losurdo, Maria a

a CNR (Italy)

b UNIVERSITY OF CATANIA (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H; ATOMIC HYDROGEN; CHEMICAL REDUCTION; MOCVD REACTOR; NON-POLAR; REAL TIME MONITORING; REAL-TIME OBSERVATION; REMOTE PLASMA SOURCES; ROOM TEMPERATURE; ZNO; ZNO FILMS; ZNO SURFACE;

ATOMIC SPECTROSCOPY; ATOMS; CHEMICAL VAPOR DEPOSITION; CORUNDUM; HYDROGEN; ION BOMBARDMENT; PLASMA DIAGNOSTICS; PLASMAS; SPECTROSCOPIC ELLIPSOMETRY; ZINC; ZINC OXIDE;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 66149149015 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200802579 Document Type: Article

Times cited : (52)

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