Ultrathin tunnel insulator films on silicon for electrochemiluminescence studies

Thin Solid Films

Volumn 517, Issue 19, 2009, Pages 5779-5782

  Niskanen, A J ^a   Ylinen Hinkka, T ^a   Kulmala, S ^a   Franssila, S ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

Atomic layer deposition; Chemical vapor deposition; Chemiluminescence; Electrochemiluminescence; Thin insulating film coated electrodes; Ultrathin silicon dioxide; Ultrathin silicon nitride

Indexed keywords

AQUEOUS SOLUTIONS; ATOMIC LAYER DEPOSITED; CHEMICAL VAPOR DEPOSITED; CONDUCTIVE SUBSTRATES; ELECTROCHEMILUMINESCENCE; HIGHLY SENSITIVE; HYDRATED ELECTRON; LIQUID PHASE; LOW PRESSURES; LUMINOPHORES; NANOMOLAR CONCENTRATION; RARE-EARTH METALS; SILICON DIOXIDE; THERMAL SILICON; THIN INSULATING FILM; THIN INSULATING FILM-COATED ELECTRODES; TUNNEL EMISSIONS; TUNNEL INSULATORS; ULTRA-THIN; ULTRATHIN SILICON DIOXIDE; ULTRATHIN SILICON NITRIDE;

ALUMINA; ATOMS; CHELATION; CHEMICAL VAPOR DEPOSITION; CHEMILUMINESCENCE; COATED WIRE ELECTRODES; CONDUCTIVE FILMS; ELECTRIC WELDING; ELECTRODES; EMITTER COUPLED LOGIC CIRCUITS; HOT ELECTRONS; HYDRATES; INSULATING MATERIALS; INSULATION; LIGHT EMISSION; LIGHT MEASUREMENT; PLASTIC FILMS; RARE EARTH ELEMENTS; SILICA; SILICON NITRIDE; TUNNELS; VAPORS;

ULTRATHIN FILMS;

EID: 66049118666     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.04.014     Document Type: Article

References (22)

1. Holmqvist T., Meschke M., and Pekola J.P. J. Vac. Sci. Technol., B 26 (2008) 28
2. Mather P.G., Perrella A.C., Tan E., Read J.C., and Buhrman R.A. Appl. Phys. Lett. 86 (2005) 242504
3. Mead C.A. J. Appl. Phys. 32 (1961) 646
4. Cohen J. J. Appl. Phys. 33 (1962) 1999
5. Ala-Kleme T., Kulmala S., and Latva M. Acta Chem. Scand. 51 (1997) 541
6. Kulmala S., Ala-Kleme T., Joela H., and Kulmala A. J. Radioanal. Nucl. Chem. 232 (1998) 91
7. Kulmala S., and Haapakka K. J. Alloys Compd. 225 (1995) 502
8. Kulmala S., Kulmala A., Ala-Kleme T., and Pihlaja J. Anal. Chim. Acta 367 (1998) 17
9. Suomi J., Håkansson M., Jiang Q., Kotiranta M., Helin M., Niskanen A.J., and Kulmala S. Anal. Chim. Acta 541 (2005) 167
10. Håkansson M., Jiang Q., Helin M., Putkonen M., Niskanen A.J., Pahlberg S., Ala-Kleme T., Heikkilä L., Suomi J., and Kulmala S. Electrochim. Acta 51 (2005) 289
11. Ala-Kleme T., Mäkinen P., Ylinen T., Väre L., Kulmala S., Ihalainen P., and Peltonen J. Anal. Chem. 78 (2006) 82
12. Grigoras K., Franssila S., and Airaksinen V.-M. Thin Solid Films 516 (2008) 5551
13. Niskanen A.J., and Franssila S. Microelectron. Eng. 57-58 (2001) 629
14. Kulmala S., Håkansson M., Spehar A.-M., Nyman A., Kankare J., Loikas K., Ala-Kleme T., and Eskola J. Anal. Chim. Acta 458 (2002) 271
15. Hattori T., Nohira H., and Takahashi K. Microelectron. Eng. 48 (1999) 17
16. Sofield C.J., and Stoneham A.M. Semicond. Sci. Technol. 10 (1995) 215
17. Wu E.Y., and Suñe J. Microelectron. Reliab. 45 (2005) 1809
18. Puurunen R.L., Delabie A., Van Elshocht S., Caymax M., Green M.L., Brijs B., Richard O., Bender H., Conrad T., Hoflijk I., Vandervorst W., Hellin D., Vanhaeren D., Zhao C., De Gendt S., and Heyns M. Appl. Phys. Lett. 86 (2005) 073116
19. Jung S., Kim J., Son H., Hwang S., Jang K., Lee J., Lee K., Park H., Kim K., Yi J., Chung H., Choi B., and Lee K. J. Appl. Phys. 102 (2007) 094502
20. Jung S., Hwang S., kim K., Dhungel S.K., Chung H.-K., Choi B.-D., Lee K.-Y., and Yi J. Thin Solid Films 515 (2007) 6615
21. Ahn J., Ting W., Chu T., Lin S., and Kwong D.L. Appl. Phys. Lett. 59 (1991) 283
22. Szekeres A., Nikolova T., Simeonov S., Gushterov A., Hamelmann F., and Heinzmann U. Microelectron. J. 37 (2006) 64