Submicron image reversal by liquid phase deposition of oxide

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 629-632

  Niskanen, Antti J ^a   Franssila, Sami ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

Image reversal; Liquid phase deposition; Oxide mask; Photoresist thinning; Selective deposition

Indexed keywords

DEPOSITS; PHOTORESISTS; PLASMA APPLICATIONS; PLASMA ETCHING; SILICA;

LIQUID PHASE DEPOSITIONS;

MASKS;

EID: 19244378969     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00494-4     Document Type: Article

References (4)