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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 1, 2008, Pages 28-31

Double oxidation scheme for tunnel junction fabrication

(3) Holmqvist, T a Meschke, M a Pekola, J P a

a AALTO UNIVERSITY (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE; MATHEMATICAL MODELS; MICROFABRICATION; OXIDATION; TEMPERATURE MEASUREMENT;

BARRIER HEIGHT; DOUBLE OXIDATION; SIMMONS MODEL;

TUNNEL JUNCTIONS;

EID: 38849088877 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.2817629 Document Type: Article

Times cited : (20)

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