Litho-only double patterning approaches: Positive-negative versus positive-positive tone

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 1, 2009, Pages

  Crouse, Michael M ^a   Uchida, Rick ^b   Van Dommelen, Youri ^a   Ando, Tomoyuki ^b   Schmitt Weaver, Emil ^a   Takeshita, Masaru ^b   Wu, Shunder ^a   Routh, Robert ^a  

^a ASML US Inc   (United States)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

32 nm node; Alternative processes; Double patterning; Litho litho etch (LLE); Litho only; Positive negative; Resist on resist

Indexed keywords

32-NM NODE; ALTERNATIVE PROCESS; DOUBLE PATTERNING; LITHO-LITHO-ETCH (LLE); LITHO-ONLY; POSITIVE-NEGATIVE; RESIST ON RESIST;

LITHOGRAPHY;

EID: 80455134829     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3042219     Document Type: Article

References (7)

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